Prosecution Insights
Last updated: October 02, 2026

Examiner: CULBERT, CHRISTOPHER A

Tech Center 2800 • Art Units: 2815 2859

This examiner grants 42% of resolved cases

Analysis

Examiner Culbert presents a challenging path in Art Unit 2815, with an allowance rate of 42.2% across 348 resolved cases. This suggests a rigorous examination process in Tech Center 2800. The median days to allowance of 1330 further highlights the difficulty, showing a very long timeline. These metrics, based on 348 resolved cases, indicate that securing a patent requires both persistence and a high level of technical justification.

The interview lift of 7.7% shows a modest benefit to engaging in direct discussion. While the 42.2% allowance rate is low, an interview can provide some momentum for more complex cases. For the 348 resolved cases, the data suggests that applicants should be prepared for a long and difficult prosecution process, using interviews as among several tools to improve their chances of success. Practitioners should use the 7.7% lift to address specific technical rejections, though the 1330-day median pendency remains a significant hurdle. A strategy focusing on both rigorous written responses and targeted interviews is recommended to navigate this examiner's high standards.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

42.2%
Allow Rate
-25.8% vs TC avg
421
Total Applications
+7.7%
Interview Lift
1330
Avg Prosecution Days
Based on 348 resolved cases, 2023–2026

Rejection Statute Breakdown

0.3%
§101 Eligibility
15.9%
§102 Novelty
59.5%
§103 Obviousness
22.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17798664 SUBSTRATE FOR MANUFACTURING DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR Final Rejection LG ELECTRONICS INC.
17944511 DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME Final Rejection Samsung Display Co., LTD.
17670804 DISPLAY DEVICE Non-Final OA Samsung Display Co., Ltd.
17573596 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Non-Final OA Samsung Display Co., LTD.
16057819 ORGANIC LIGHT EMITTING DIODE DISPLAY AND MANUFACTURING METHOD THEREOF Non-Final OA Samsung Display Co., Ltd.
17942510 SEMICONDUCTOR DEVICE Final Rejection TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
17410804 DISPLAY APPARATUS Non-Final OA LG DISPLAY CO., LTD.
16984907 DISPLAY DEVICE Non-Final OA LG Display Co., Ltd.
17557940 METHOD FOR INHIBITING FORMABLE MATERIAL EVAPORATION, SYSTEM FOR INHIBITING EVAPORATION, AND METHOD OF MAKING AN ARTICLE Non-Final OA CANON KABUSHIKI KAISHA
17485398 MICRO LED LASER RELEASE FROM SILICON WAFER Final Rejection Intel Corporation
17232010 THROUGH GATE FIN ISOLATION Non-Final OA Intel Corporation
17650445 INKJET RECORDING MEDIUM FOR ORGANIC SEMICONDUCTOR DEVICE, MEMBER FOR ORGANIC SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD FOR ORGANIC SEMICONDUCTOR DEVICE Final Rejection Konica Minolta, Inc.
15426942 BONDED STRUCTURES WITH INTEGRATED PASSIVE COMPONENT Non-Final OA ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
17555740 SELECTIVE STOP TO CONTROL HEATER HEIGHT VARIATION Non-Final OA International Business Machines Corporation
17546178 ELECTRODE RECESSED PHASE CHANGE MEMORY PORE CELL Non-Final OA International Business Machines Corporation
17493813 ARTIFICIAL INTELLIGENCE (AI) DEVICES WITH IMPROVED THERMAL STABILITY AND SCALING BEHAVIOR Non-Final OA International Business Machines Corporation
17942814 SEMICONDUCTOR MEMORY DEVICE Non-Final OA SK hynix Inc.
17848107 MEMORY DEVICE HAVING CONTROL GATE DIELECTRIC STRUCTURE WITH DIFFERENT DIELECTRIC MATERIALS Non-Final OA Micron Technology, Inc
17498046 ELECTRODE/DIELECTRIC BARRIER MATERIAL FORMATION AND STRUCTURES Non-Final OA Micron Technology, Inc.
17896081 MEMORY DEVICE AND METHOD OF MAKING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17835769 SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17742714 FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH OXIDE SEMICONDUCTOR CHANNEL Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18781018 Metal Contacts on Metal Gates and Methods Thereof Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
17868635 Methods Of Forming Metal Gate Spacer Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
17752558 TRANSDUCER DEVICE AND METHOD OF MANUFACTURE Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
16655156 CONDUCTIVE STRUCTURE, SEMICONDUCTOR PACKAGE AND METHODS OF FORMING THE SAME Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.
16283838 SEMICONDUCTOR DEVICE AND METHODS OF FORMING THE SAME Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.
17268461 PEROVSKITE LIGHT-EMITTING DEVICE COMPRISING PASSIVATION LAYER AND MANUFACTURING METHOD THEREFOR Non-Final OA SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
18946259 COMPOUND FOR ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTRIC ELEMENT COMPRISING THE SAME, AND ELECTRONIC DEVICE THEREOF Non-Final OA DUK SAN NEOLUX CO., LTD.
17950069 SENSING DEVICE Non-Final OA AUO Corporation

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