Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2800 2817 2876 2897
This examiner grants 50% of resolved cases
Examiner Everett Trajan Ririe is assigned to Tech Center 2800 and Art Unit 2800. The data shows 2 resolved cases, with an allowance rate of 50.0%. This small sample size indicates a very limited history for this examiner, which practitioners should keep in mind. The 50.0% rate means that a portion of the 2 resolved cases resulted in a grant.
The interview lift is 0.0%. This suggests that in the 2 resolved cases, interviews did not lead to an increase in the allowance rate. The median days to allowance is 997. This figure provides a preliminary timeline for the duration of successful prosecution in Art Unit 2800.
For practitioners, the 50.0% allowance rate and the 997-day median pendency suggest a balanced but uncertain process. The 0.0% interview lift indicates that, based on the current limited data, interviews have not yet been shown to be a decisive factor. With only 2 resolved cases, the examiner's long-term patterns are still being established.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18670805 | SEMICONDUCTOR DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18623488 | SEMICONDUCTOR PACKAGE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18487644 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18769472 | DRIVING BACKPLANE, LIGHT EMITTING SUBSTRATE, BACKLIGHT MODULE AND DISPLAY APPARATUS | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18578670 | QUANTUM DOT LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREFOR, DISPLAY PANEL, AND DISPLAY APPARATUS | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18655442 | NITRIDE STRUCTURE AND SEMICONDUCTOR DEVICE | Non-Final OA | TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION |
| 18487706 | Microelectromechanical Device for Generating Sound Pressure | Non-Final OA | Robert Bosch GmbH |
| 18181155 | INTEGRATED CIRCUIT DEVICE WITH BACKSIDE FIN TRIM ISOLATION | Non-Final OA | Intel Corporation |
| 18487625 | VERTICAL CHANNEL THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
| 18065120 | SUPER VIA WITH SIDEWALL SPACER | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18565697 | DISPLAY PANEL AND DISPLAY DEVICE | Non-Final OA | Honor Device Co., Ltd. |
| 17850149 | SEMICONDUCTOR CHIP INCLUDING A CHIP GUARD | Final Rejection | SK hynix Inc. |
| 18643554 | Memory Arrays And Methods Used In Forming A Memory Array Comprising Strings Of Memory Cells | Final Rejection | Micron Technology, Inc. |
| 18418142 | POLISHING APPARATUS AND POLISHING METHOD USING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18487451 | SEMICONDUCTOR DEVICE WITH NON-CONFORMAL WORK FUNCTION LAYERS AND METHODS OF FABRICATION THEREOF | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18591758 | SEMICONDUCTOR PACKAGES WITH SIGNAL INTEGRATION AND THE METHODS OF MANUFACTURING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18195058 | SEMICONDUCTOR PACKAGE WITH UNDER-BUMP METALLIZATION PROVIDING IMPROVED PACKAGE RELIABILITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company |
| 18660967 | SEMICONDUCTOR DEVICE | Non-Final OA | Rohm Co., Ltd. |
| 17816407 | OLED DISPLAY PANEL AND FABRICATION METHOD THEREOF | Final Rejection | SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 18754464 | GROUP III ELEMENT NITRIDE SEMICONDUCTOR SUBSTRATE, EPITAXIAL SUBSTRATE, AND FUNCTIONAL ELEMENT | Non-Final OA | NGK INSULATORS, LTD. |
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