Tech Center 2800 • Art Units: 1693 1711 1715 1717 1737 1759 1784 1787 1792 1796
This examiner grants 52% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19531336 | ENGINEERED STONE SLAB, AND APPARATUS AND METHOD FOR CREATING | Final Rejection | SQIP, LLC |
| 19531511 | SULFUR CATHODES, SULFUR CATHODE MATERIALS, AND APPARATUS AND METHODS FOR MAKING SAME | Non-Final OA | CarbonIP Technologies Inc. |
| 18403204 | INHIBITOR FOR SELECTIVELY DEPOSITING THIN FILM AND METHOD FOR SELECTIVELY DEPOSITING THIN FILM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19298515 | METHOD FOR MANUFACTURING ANODE ACTIVE MATERIAL LAYER AND METHOD FOR MANUFACTURING SECONDARY BATTERY | Non-Final OA | TOYOTA JIDOSHA KABUSHIKI KAISHA |
| 18644077 | MANUFACTURING METHOD OF ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 19085453 | ACRYLIC ACID PLASMA POLYMERIZATION FILM AND PRODUCTION METHOD THEREFOR | Final Rejection | TOYODA GOSEI CO., LTD. |
| 18545064 | Molding Material | Non-Final OA | SEIKO EPSON CORPORATION |
| 18879445 | METHOD FOR MANUFACTURING STATOR FOR ROTARY ELECTRIC MACHINE | Non-Final OA | AISIN CORPORATION |
| 18559811 | COMPOSITIONS, COMPRISING PLATELET-SHAPED TRANSITION METAL PARTICLES | Non-Final OA | BASF SE |
| 18262211 | TWO-COMPONENT SYSTEM FOR PREPARING DEODORANT POLYURETHANE FOAMS | Non-Final OA | BASF SE |
| 19226344 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Non-Final OA | SK Hynix Inc. |
| 18276914 | METHOD FOR MANUFACTURING SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18036766 | COATING AGENT COMPOSITION, SURFACE TREATMENT AGENT COMPRISING SAID COMPOSITION, AND ARTICLE SURFACE-TREATED WITH SAID SURFACE TREATMENT AGENT | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 19314701 | STRUCTURAL MEMBER | Non-Final OA | TOTO LTD. |
| 18585922 | WATER-CURABLE SILICONE COMPOSITIONS AND RELATED METHODS | Final Rejection | BMIC LLC |
| 18454447 | METHOD FOR FABRICATING ENHANCEMENT MODE TRANSISTOR MATERIAL, ENHANCEMENT MODE TRANSISTOR MATERIAL FABRICATED THEREBY, ENHANCEMENT MODE TRANSISTOR INCLUDING THE SAME, AND AMPLIFYING CIRCUIT INCLUDING THE SAME | Non-Final OA | RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY |
| 19261691 | METHOD AND APPARATUS FOR FORMING MOLYBDENUM METAL FILM | Non-Final OA | Tokyo Electron Limited |
| 19184288 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17906353 | FILM FORMATION METHOD AND FILM FORMATION APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18555108 | METHOD OF CURING A WATERBORNE COATING | Non-Final OA | SWIMC LLC |
| 18241465 | LAMINATE AND METHOD FOR PRODUCING SAME | Final Rejection | KANEKA CORPORATION |
| 18848912 | METHOD FOR MANUFACTURING HOT-DIP GALVANIZED STEEL SHEET, AND EQUIPMENT FOR MANUFACTURING HOT-DIP GALVANIZED STEEL SHEET | Non-Final OA | JFE STEEL CORPORATION |
| 18567068 | THERMALLY CONDUCTIVE COMPOSITION | Non-Final OA | HENKEL IP & HOLDING GMBH |
| 18736434 | FORMATION METHOD OF SILICON NITRIDE FILM | Non-Final OA | Dexerials Corporation |
| 18272445 | POLYACETAL RESIN COMPOSITION | Non-Final OA | MITSUBISHI GAS CHEMICAL COMPANY, INC. |
| 18583454 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | Non-Final OA | CENTRAL GLASS COMPANY, LIMITED |
| 18696736 | FLUOROPOLYMER-FREE PROCESSING AIDS FOR ETHYLENE-BASED POLYMERS | Non-Final OA | ExxonMobil Chemical Patents Inc. |
| 18708228 | SILICONE COMPOSITIONS AND THEIR APPLICATIONS | Non-Final OA | DOW SILICONES CORPORATION |
| 18547924 | VINYL CHLORIDE RESIN COMPOSITION, VINYL CHLORIDE RESIN MOLDED PRODUCT, AND LAMINATE | Final Rejection | ZEON CORPORATION |
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