Tech Center 2800 • Art Units: 2811 2816 2818 2896
This examiner grants 40% of resolved cases
Lauren R. Bell examines patent applications in Tech Center 2800, primarily within Art Unit 2811. The examiner has a record of 390 resolved cases, which provides a view of the prosecution style. The allowance rate stands at 40.3 percent, indicating the frequency of successful outcomes for applicants. This 40.3 percent rate suggests that many cases may face hurdles during the examination process. The 390 resolved cases establish a clear statistical baseline for this docket.
The interview lift is 32.3 percent, which is a positive indicator for those seeking an allowance. This 32.3 percent lift suggests that an interview correlates with an increase in the chances of success when compared to the 40.3 percent allowance rate. Practitioners should view the interview as a tool for addressing the examiner's objections. The median days to allowance is 1265, representing the typical duration for applications that reach a grant. This 1265 median days to allowance indicates the timeframe required for successful prosecution.
The data in Art Unit 2811 shows that the interview lift is 32.3 percent, offering a path forward for applicants. The 1265 median days to allowance helps set expectations for the overall timeline in Tech Center 2800. While the 40.3 percent allowance rate reflects the difficulty of the docket, the interview lift provides a mechanism for improvement. These figures emphasize the importance of direct communication in achieving a positive outcome with this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18650251 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18637844 | WIRING STRUCTURE, METHOD OF MANUFACTURING THE WIRING STRUCTURE, AND SEMICONDUCTOR PACKAGE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17864716 | INTEGRATED CIRCUIT DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18250792 | DISPLAY PANEL AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE | Final Rejection | BOE Technology Group Co., Ltd. |
| 18526872 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 18300228 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18131827 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Samsung Display Co., LTD. |
| 18082515 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 17421367 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR | Non-Final OA | Samsung Display Co., Ltd. |
| 18404720 | DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME | Final Rejection | LG Display Co., Ltd. |
| 17994684 | Organic Light Emitting Diode Display | Final Rejection | LG Display Co., Ltd. |
| 17971448 | DISPLAY DEVICE INCLUDING SEMICONDUCTOR LIGHT EMITTING DEVICE | Final Rejection | LG Display Co., Ltd. |
| 18624483 | Epitaxial wafer, Method of manufacturing the epitaxial wafer, and Method of manufacturing a semiconductor device using the epitaxial wafer | Non-Final OA | UIF (University Industry Foundation), Yonsei University |
| 18730830 | LIGHT EMITTING ELEMENT AND LIGHT EMITTING DEVICE | Non-Final OA | NICHIA CORPORATION |
| 18299282 | LIGHT-EMITTING ELEMENT, METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENT, AND LIGHT-EMITTING DEVICE | Non-Final OA | NICHIA CORPORATION |
| 18429571 | Electronic Device | Non-Final OA | InnoLux Corporation |
| 18359891 | METHOD OF MANUFACTURING ELECTRONIC DEVICE | Final Rejection | Innolux Corporation |
| 18093373 | SIDEWALL ARRANGEMENTS FOR LIGHT-EMITTING DIODE DEVICES AND RELATED METHODS | Non-Final OA | CreeLED, Inc. |
| 18309308 | SEMICONDUCTOR DEVICES WITH DOUBLE-SIDED FANOUT CHIP PACKAGES | Non-Final OA | Avago Technologies International Sales Pte. Limited |
| 18538192 | SEMICONDUCTOR DEVICE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18538161 | SEMICONDUCTOR DEVICE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18102808 | SEMICONDUCTOR DEVICE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18527971 | COMPRESSIVE STRAIN IN STACKED NANOSHEET FIELD EFFECT TRANSISTOR | Final Rejection | International Business Machines Corporation |
| 18189411 | DIFFERENT WORK FUNCTION METALS | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 17956309 | EXTENDED EPITAXIAL GROWTH FOR IMPROVED CONTACT RESISTANCE | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18355238 | IMAGE SENSING DEVICE | Final Rejection | SK hynix Inc. |
| 17406953 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY DEVICE | Final Rejection | SK hynix Inc. |
| 17446370 | MICROELECTRONIC DEVICES HAVING TRANSITION AREAS INCLUDING UPPER DUMMY PILLARS SPACED FROM SOURCE/DRAIN CONTACTS, AND RELATED METHODS AND SYSTEMS | Non-Final OA | Micron Technology, Inc. |
| 18599702 | CHANNEL EXTENSION STRUCTURES FOR SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18405318 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
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