Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2818
This examiner grants 75% of resolved cases
Nicholas Brian Michaud operates within Tech Center 2800 and Art Unit 2818, where he has managed 59 resolved cases. His allowance rate stands at 74.6 percent. Practitioners should note that the median days to allowance for this examiner is 1208, which provides a timeline for expectations regarding the duration of the prosecution process. This 1208-day duration reflects the typical path for the 59 resolved cases in his history.
The data highlights an interview lift of 30.9 percent. This metric indicates that conducting an interview with the examiner is associated with a higher probability of reaching an allowance compared to cases where no interview occurs. This lift suggests that direct engagement is an effective strategy for overcoming rejections. The 30.9 percent lift is a factor for attorneys to consider when the 74.6 percent allowance rate is not met through written responses alone. Direct communication may help clarify technical issues and expedite the examination process.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18765633 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18538631 | SUBSTRATE HAVING UNDERFILL DAM AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR PACKAGE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18294098 | ARRAY SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE, AND TILED DISPLAY APPARATUS | Final Rejection | BOE TECHNOLOGY GROUP CO., LTD. |
| 18562556 | SILICON-BASED MASK, MANUFACTURING METHOD, AND DISPLAY PANEL | Final Rejection | BOE TECHNOLOGY GROUP CO., LTD. |
| 18339583 | LIGHT EMITTING ELEMENT, DISPLAY DEVICE INCLUDING THE SAME, AND METHOD OF FABRICATING THE DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18434084 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | Toshiba Electronic Devices & Storage Corporation |
| 18394754 | DISPLAY APPARATUS | Final Rejection | LG Display Co., Ltd. |
| 18171864 | OPTOELECTRONIC DEVICE WITH SUB-WAVELENGTH ANTIREFLECTIVE STRUCTURE, ASSOCIATED SCREEN AND MANUFACTURING METHOD | Final Rejection | COMMISSARIAT À L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
| 18593989 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Kioxia Corporation |
| 18593988 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Kioxia Corporation |
| 18443013 | MERGED CAVITIES FOR CONDUCTOR FORMATION IN A MEMORY DIE | Non-Final OA | Micron Technology, Inc. |
| 17888650 | SILICIDE INTERFCACES OF DEVICE HAING DIFFERENT CONDUCTIVITY TYPE TRANSISTORS AND METHOD THEREOF | Non-Final OA | Micron Technology, Inc. |
| 18781335 | SEMICONDUCTOR DEVICE HAVING THERMALLY CONDUCTIVE AIR GAP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18778989 | MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18486203 | METHOD FOR TWO-DIMENSIONAL MENTAL LINE PATTERNING | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17747058 | SEMICONDUCTOR DEVICE HAVING NANOSHEET TRANSISTORS AND BACK-SIDE INTERCONNECT STRUCTURE COMPRISING POWER LINE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18442758 | SEMICONDUCTOR PACKAGE AND METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17864552 | Metal Surface Blocking Molecules for Selective Deposition | Non-Final OA | Applied Materials, Inc. |
| 18443115 | PIXEL DEVICE AND DISPLAY APPARATUS HAVING THE SAME | Final Rejection | SEOUL VIOSYS CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy