Prosecution Insights
Last updated: May 29, 2026

Examiner: NICELY, JOSEPH C

Tech Center 2800 • Art Units: 2813

This examiner grants 77% of resolved cases

Performance Statistics

77.3%
Allow Rate
+9.3% vs TC avg
828
Total Applications
+20.1%
Interview Lift
866
Avg Prosecution Days
Based on 784 resolved cases, 2023–2026

Rejection Statute Breakdown

0.9%
§101 Eligibility
8.4%
§102 Novelty
78.5%
§103 Obviousness
6.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18501980 SEMICONDUCTOR MEMORY DEVICE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17900183 POWER DEVICE AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
17502692 FIELD PLATE ARRANGEMENT FOR TRENCH GATE FET Non-Final OA TEXAS INSTRUMENTS INCORPORATED
17903518 SEMICONDUCTOR DEVICE AND PREPARATION METHOD THEREOF Non-Final OA Huawei Technologies Co., Ltd.
18084484 SEMICONDUCTOR DEVICE Final Rejection Toshiba Electronic Devices & Storage Corporation
18502440 SEMICONDUCTOR DEVICE Non-Final OA Murata Manufacturing Co., Ltd.
18518585 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18502640 INTERCONNECT STRUCTURE WITH LOW RC DELAY AND METHOD FOR MANUFACTURING THE SAME Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18153751 MULTI-FINGER HIGH-ELECTRON MOBILITY TRANSISTOR Non-Final OA NEXPERIA B.V.
18152845 SEMICONDUCTOR DEVICE AND ESD PROTECTION DEVICE COMPRISING THE SAME Non-Final OA NEXPERIA B.V.
18059129 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Final Rejection RENESAS ELECTRONICS CORPORATION
18697212 BIFACIAL SOLAR CELL AND PREPARATION METHOD THEREFOR Non-Final OA TONGWEI SOLAR (MEISHAN) CO., LTD.
18156120 WIDE BAND GAP TRANSISTOR WITH NANOLAMINATED INSULATING GATE STRUCTURE AND PROCESS FOR MANUFACTURING A WIDE BAND GAP TRANSISTOR Non-Final OA STMICROELECTRONICS S.r.l.
18360555 SEMICONDUCTOR DIE STACKING ARCHITECTURE AND CONNECTION METHOD THEREFORE Non-Final OA Sandisk Technologies, Inc.
18140253 SEMICONDUCTOR DEVICE HAVING A TRENCH STRUCTURE WITH LOWER, UPPER, AND INTERMEDIARY SECTIONS AND METHOD OF PRODUCING THE SEMICONDUCTOR DEVICE Final Rejection Infineon Technologies Austria AG
18228713 FIELD-EFFECT TRANSISTORS WITH A GATE DIELECTRIC LAYER FORMED ON A SURFACE TREATED BY ATOMIC LAYER ETCHING Non-Final OA GlobalFoundries U.S. Inc.
18502103 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME Non-Final OA UNITED MICROELECTRONICS CORP.
18059265 SEMICONDUCTOR DEVICE AND METHODS FOR FORMING THE SAME Non-Final OA Vanguard International Semiconductor Corporation
18299245 METHOD FOR MANUFACTURING TRENCH-TYPE MOSFET Non-Final OA Hangzhou Silicon-Magic Semiconductor Technology Co., Ltd.
18197909 TRANSISTOR Non-Final OA STMicroelectronics (Rousset) SAS

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