Prosecution Insights
Last updated: October 01, 2026

Examiner: MEHTA, RATISHA

Tech Center 2800 • Art Units: 2800 2817 2895 2896 2899

This examiner grants 90% of resolved cases

Analysis

Ratisha Mehta is a patent examiner in Tech Center 2800, working within Art Unit 2800. The examiner has 645 resolved cases and an allowance rate of 89.6 percent. This 89.6 percent rate reflects the proportion of applications that reach a grant. For the 645 cases handled, this data provides a basis for understanding the probability of success during the examination process. The volume of resolved cases reflects the examiner's experience within Tech Center 2800.

The median days to allowance for this examiner is 734. This 734-day timeline represents the duration for an application to move from filing to a grant. Applicants should consider this period when planning their patent strategy and resource allocation. The volume of 645 resolved cases suggests that this duration is a consistent aspect of the examiner's workflow in Art Unit 2800. This median provides a specific metric for evaluating the expected length of prosecution.

The data shows an interview lift of 5.6 percent. This 5.6 percent lift represents the change in the likelihood of allowance when an interview is conducted. It suggests that direct communication is a method for addressing the probability of a grant. For practitioners, utilizing an interview is an option to navigate the prosecution process and achieve a positive outcome. Practitioners can use this lift to evaluate the potential benefits of direct engagement.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

89.6%
Allow Rate
+21.6% vs TC avg
671
Total Applications
+5.6%
Interview Lift
734
Avg Prosecution Days
Based on 645 resolved cases, 2023–2026

Rejection Statute Breakdown

0.9%
§101 Eligibility
27.9%
§102 Novelty
47.4%
§103 Obviousness
12.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18711005 DISPLAY DEVICE Non-Final OA LG ELECTRONICS INC.
18738153 SEMICONDUCTOR PACKAGE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18521994 INTERCONNECT STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME Final Rejection Samsung Electronics Co., Ltd.
18762750 DISPLAY PANEL Non-Final OA BOE TECHNOLOGY GROUP CO., LTD.
18695944 LIGHT-EMITTING UNIT AND METHOD FOR PREPARING SAME, DISPLAY PANEL, AND DISPLAY DEVICE Non-Final OA BOE Technology Group Co., Ltd.
18617991 DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME Non-Final OA Samsung Display Co., LTD.
18494387 DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME Final Rejection Samsung Display Co., LTD.
18492927 THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THE SAME, AND DISPLAY DEVICE HAVING THE SAME Non-Final OA Samsung Display Co., LTD.
18213900 DISPLAY DEVICE Non-Final OA Samsung Display Co., Ltd.
18189066 DISPLAY DEVICE Final Rejection Samsung Display Co., LTD.
18518230 DISPLAY DEVICE Non-Final OA LG Display Co., Ltd.
18743090 TRANSFERRING HEAD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE Non-Final OA InnoLux Corporation
18703792 Power Module and Method for Assembling a Power Module Non-Final OA ZF Friedrichshafen AG
18148717 METHODS AND APPARATUS TO DETECT DEFECTS DURING SEMICONDUCTOR CHIP FABRICATION AND/OR TO DEBUG SEMICONDUCTOR CHIPS AFTER FABRICATION Non-Final OA Intel Corporation
18361834 Laterally-Diffused Metal-Oxide Semiconductor Devices with Reduced Gate Charge and Time-Dependent Dielectric Breakdown Non-Final OA Avago Technologies International Sales Pte. Limited
18535332 STACKED FET WITH SHIFTED CHANNEL STRUCTURE Non-Final OA International Business Machines Corporation
18478213 MEMORY DEVICE Non-Final OA Kioxia Corporation
18478087 PACKAGES WITH STEPPED CONDUCTIVE TERMINALS Final Rejection TEXAS INSTRUMENTS INCORPORATED
18424704 MICROELECTRONIC DEVICES INCLUDING CONTACT STRUCTURES, AND RELATED MEMORY DEVICES, AND ELECTRONIC SYSTEMS Non-Final OA Micron Technology, Inc.
18780748 CUT METAL GATE IN MEMORY MACRO EDGE AND MIDDLE STRAP Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18408932 SEMICONDUCTOR DEVICE AND METHOD Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18523255 LOW MELT POINT METAL BASED THERMAL INTERFACE MATERIAL Non-Final OA Honeywell International Inc.
18598866 MOSFETS WITH IMPLANTED CHARGE COMPENSATION REGIONS Non-Final OA Wolfspeed, Inc.
18534754 SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF Final Rejection UNITED MICROELECTRONICS CORP.

Facing This Examiner?

IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.

Build Your Strategy

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month