Tech Center 2800 • Art Units: 2800 2812 2823 2897 2898
This examiner grants 58% of resolved cases
Bryan R Junge is a USPTO patent examiner in Tech Center 2800 and Art Unit 2800. The examiner has 625 resolved cases, which results in an allowance rate of 58.1%. This percentage indicates the frequency of granted patents among the resolutions. The median days to allowance for these cases is 953, providing a benchmark for the timeline of successful prosecution in this unit.
The data shows an interview lift of 8.9%. This figure indicates that applications involving an interview have a higher probability of allowance than those without one. With 625 resolved cases, the examiner has a history of resolutions in Tech Center 2800. Practitioners can use the 953-day median to manage expectations regarding the duration of the patent acquisition process.
In Art Unit 2800, the examiner's 58.1% allowance rate and 8.9% interview lift are metrics for strategy. The median pendency is a figure that describes the time required to reach an allowance. These data points from the resolved cases offer an overview of the examiner's performance. Applicants should consider the 8.9% lift when deciding whether to request an interview.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18638771 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18626444 | SEMICONDUCTOR PACKAGE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17685593 | INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18407382 | DISPLAY APPARATUS | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 17846842 | DISPLAY APPARATUS AND METHOD OF PROVIDING THE SAME | Final Rejection | Samsung Display Co., Ltd. |
| 16915174 | DISPLAY APPARATUS AND METHOD OF REPAIRING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18645408 | ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | Innolux Corporation |
| 18502025 | ELECTRONIC DEVICE | Final Rejection | InnoLux Corporation |
| 18464248 | CONNECTION STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME | Final Rejection | Innolux Corporation |
| 18013532 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE | Final Rejection | SHARP KABUSHIKI KAISHA |
| 17556660 | TECHNIQUES FOR DIE TILING | Final Rejection | Intel Corporation |
| 18402950 | METHODS AND SYSTEMS FOR FORMING STRUCTURES COMPRISING A THRESHOLD VOLTAGE TUNING LAYER | Non-Final OA | ASM IP Holding B.V. |
| 18036993 | Semiconductor Device, Display Device, Display Module, and Electronic Device | Non-Final OA | Semiconductor Energy Laboratory Co., Ltd. |
| 18630684 | IMAGING DEVICE AND METHOD OF MANUFACTURING IMAGING DEVICE | Non-Final OA | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 17842417 | MAGNETIC MEMORY DEVICE | Final Rejection | Kioxia Corporation |
| 18440581 | MICROELECTRONIC DEVICES WITH MULTIPLE STEP CONTACTS EXTENDING TO STEPPED TIERS, AND RELATED METHODS | Non-Final OA | Micron Technology, Inc. |
| 18664767 | High-K Gate Dielectric and Method Forming Same | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18219245 | WIRING STRUCTURE WITH CONDUCTIVE FEATURES HAVING DIFFERENT CRITICAL DIMENSIONS, AND METHOD OF MANUFACTURING THE SAME | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 17879995 | WIRING STRUCTURE WITH CONDUCTIVE FEATURES HAVING DIFFERENT CRITICAL DIMENSIONS, AND METHOD OF MANUFACTURING THE SAME | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 18500721 | TRANSISTOR CIRCUITS INCLUDING FRINGELESS TRANSISTORS AND METHOD OF MAKING THE SAME | Non-Final OA | SANDISK TECHNOLOGIES LLC |
| 18020032 | METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR WAFER AND NITRIDE SEMICONDUCTOR WAFER | Non-Final OA | SHIN-ETSU HANDOTAI CO., LTD. |
| 18548616 | METHOD FOR MANUFACTURING A SILICON-CARBIDE-BASED SEMICONDUCTOR STRUCTURE AND INTERMEDIATE COMPOSITE STRUCTURE | Final Rejection | Soitec |
| 18175092 | METHOD FOR MANUFACTURING SIGMA-SHAPED GROOVE | Non-Final OA | Shanghai Huali Integrated Circuit Corporation |
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