Tech Center 4100 • Art Units: 2811 4100
This examiner grants 95% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18731176 | SEMICONDUCTOR DEVICE AND DATA STORAGE SYSTEM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18643149 | HIGH PERFORMANCE SEMICONDUCTOR DEVICES USING MULTI-BRIDGE-CHANNEL FIELD EFFECT TRANSISTORS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18639136 | IMAGE SENSOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18594350 | THREE DIMENSIONAL NON-VOLATILE MEMORY DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18402916 | POWER SEMICONDUCTOR MODULE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | HYUNDAI MOBIS CO., LTD. |
| 18706363 | DISPLAY PANEL | Non-Final OA | WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 18709823 | DISPLAY SUBSTRATE AND DISPLAY DEVICE | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18590308 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Samsung Display Co., LTD. |
| 18216493 | PERFORMANCE OPTIMIZATION OF TRANSISTORS SHARING CHANNEL STRUCTURES OF VARYING WIDTH | Non-Final OA | Intel Corporation |
| 18214898 | INTEGRATED CIRCUIT STRUCTURES WITH DIFFERENTIAL EPITAXIAL SOURCE OR DRAIN DENT | Non-Final OA | Intel Corporation |
| 18339685 | GLASS LAYERS AND CAPACITORS FOR USE WITH INTEGRATED CIRCUIT PACKAGES | Non-Final OA | Intel Corporation |
| 18593504 | FLEXIBLE DESIGN AND PLACEMENT OF ALIGNMENT MARKS | Non-Final OA | Micron Technology, Inc. |
| 18767168 | SEMICONDUCTOR DEVICE WITH FIN STRUCTURES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18758948 | SEMICONDUCTOR STRUCTURES AND METHODS THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18616386 | SEMICONDUCTOR DEVICE STRUCTURE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18612420 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18671497 | GATE PATTERNING PROCESS FOR MULTI-GATE DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18641904 | Gate-All-Around Field-Effect Transistors In Integrated Circuits | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18631092 | OPTICAL CONNECTOR UNIT FOR A PHOTONIC ASSEMBLY AND METHODS FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18730681 | MEMORY DEVICE WITH STAIRCASE FREE STRUCTURE AND METHODS FOR FORMING THE SAME | Non-Final OA | Applied Materials, Inc. |
| 18396524 | POWER MOSFET DEVICE WITH PROTECTION AGAINST THE CONTAMINANTS AND RELATED MANUFACTURING PROCESS | Final Rejection | STMicroelectronics International N.V. |
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