Prosecution Insights
Last updated: October 01, 2026

Examiner: TRAN, TRANG Q

Tech Center 2800 • Art Units: 2800 2811

This examiner grants 81% of resolved cases

Analysis

Trang Q Tran serves in Tech Center 2800 and Art Unit 2800, with a record of 738 resolved cases. The allowance rate stands at 81.3 percent, indicating the frequency of successful outcomes. These 738 resolved cases offer a data set for understanding the examiner's approach. This volume of cases forms the basis for the current metrics.

The interview lift is 7.3 percent, which highlights the impact of oral advocacy during prosecution. A median days to allowance of 984 provides a benchmark for the speed of the process. Within Art Unit 2800, these statistics reflect the examiner's typical workflow and decision-making timeline.

For practitioners, the 7.3 percent interview lift is a relevant metric when considering a request for a personal discussion. The 81.3 percent allowance rate and the 984 median days to allowance are factors for setting realistic goals. Data from Tech Center 2800 suggests a predictable environment for patent applications.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

81.3%
Allow Rate
+13.3% vs TC avg
776
Total Applications
+7.3%
Interview Lift
984
Avg Prosecution Days
Based on 738 resolved cases, 2023–2026

Rejection Statute Breakdown

0.1%
§101 Eligibility
35.5%
§102 Novelty
47.1%
§103 Obviousness
16.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18740045 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18437473 STACKED INTEGRATED CIRCUIT DEVICE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18497672 SEMICONDUCTOR PACKAGE Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18222567 SEMICONDUCTOR PACKAGE Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18208979 SEMICONDUCTOR MEMORY DEVICE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC SYSTEM INCLUDING THE SAME Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18021197 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS Final Rejection BOE TECHNOLOGY GROUP CO., LTD.
18408087 DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Display Co., LTD.
18415679 ELECTRONIC DEVICE Non-Final OA InnoLux Corporation
18242322 PACKAGE WITH EMBEDDED CAPACITORS Final Rejection Intel Corporation
17825340 INTEGRATED CIRCUIT ASSEMBLIES HAVING INTERCONNECTION BRIDGES SPANNING INTEGRATED CIRCUIT DEVICES THEREIN Final Rejection Intel Corporation
17481234 MULTIPLE DIES COUPLED WITH A GLASS CORE SUBSTRATE Final Rejection Intel Corporation
18020758 SEMICONDUCTOR DEVICE Non-Final OA Semiconductor Energy Laboratory Co., Ltd.
17899909 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR STORAGE DEVICE Non-Final OA Kioxia Corporation
17899260 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Non-Final OA KIOXIA CORPORATION
18429228 LASER ANNEAL FORMED NANOSHEET LDMOS TRANSISTOR Non-Final OA Texas Instruments Incorporated
18428306 SPLIT-GATE TRENCH POWER MOSFET WITH THICK POLY-TO-POLY ISOLATION Non-Final OA STMicroelectronics International N.V.
18593444 SEMICONDUCTOR DEVICES WITH EPITAXIAL SOURCE/DRAIN REGION WITH A BOTTOM DIELECTRIC AND METHODS OF FABRICATION THEREOF Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18415668 SEMICONDUCTOR PACKAGE AND METHOD OF FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18405146 SEMICONDUCTOR DEVICES WITH EPITAXIAL SOURCE/DRAIN REGION WITH A BOTTOM DIELECTRIC AND METHODS OF FABRICATION THEREOF Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18498031 DUMMY DIES AND METHOD OF FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18788697 SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18786482 PACKAGE AND METHOD OF FABRICATING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18428315 SEMICONDUCTOR DEVICE AND METHOD Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18334695 Integrated Circuit Package and Methods of Forming the Same Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.
18151856 Die Structures and Methods of Forming the Same Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.
18431001 OLED STRUCTURE AND PROCESS BASED ON PIXEL PASSIVATION BY REMOVING OLED STACK OVER HEAT ABSORBENT STRUCTURES Non-Final OA Applied Materials, Inc.
18408016 TRANSFERRABLE POLYCHROMIC microLEDs Non-Final OA Lumileds LLC
18582677 MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Non-Final OA MACRONIX International Co., Ltd.
18132602 HIGH-DENSITY-INTERCONNECTION PACKAGING STRUCTURE AND METHOD FOR PREPARING SAME Non-Final OA SJ Semiconductor(Jiangyin) Corporation

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