Prosecution Insights
Last updated: October 02, 2026

Examiner: KHALIFA, MOATAZ

Tech Center 2800 • Art Units: 2815 2817

This examiner grants 91% of resolved cases

Analysis

Moataz Khalifa, an examiner in Tech Center 2800 and Art Unit 2815, has a very high allowance rate of 90.9 percent across 66 resolved cases. The median days to allowance is 1263. While the probability of grant is high, the timeline to reach that result is longer than in some other units, reflecting a deliberate examination pace for the 90.9 percent of successful cases.

The interview lift is 2.3 percent, which is a modest increase. Given that the baseline allowance rate is already 90.9 percent, there is limited room for lift, but the positive value still indicates that interviews do not hinder progress. Applicants can expect a high likelihood of success through standard prosecution, with interviews serving as a minor supplemental tool for resolving specific issues.

Strategy for this examiner should focus on patience, given the 1263 median days to allowance. While the 90.9 percent allowance rate is excellent, the 2.3 percent interview lift suggests that most cases are resolved through written prosecution. Practitioners should ensure that their initial filings are thorough to capitalize on the high probability of a grant in Art Unit 2815.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

90.9%
Allow Rate
+22.9% vs TC avg
112
Total Applications
+2.3%
Interview Lift
1263
Avg Prosecution Days
Based on 66 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
18.7%
§102 Novelty
74.2%
§103 Obviousness
4.6%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18394926 SEMICONDUCTOR DEVICES HAVING ENHANCED KEY PATTERNS THEREIN AND METHODS OF FABRICATING SAME Non-Final OA Samsung Electronics Co., Ltd.
17885237 VIA STRUCTURE CONNECTING FRONT SIDE STRUCTURE OF SEMICONDUCTOR DEVICE TO BSPDN, AND METHOD OF MANUFACTURING THE SAME USING SACRIFICIAL VIA STRUCTURE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17875208 DISPLAY PANEL AND ELECTRONIC DEVICE INCLUDING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17649217 SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17896335 DISPLAY PANEL AND DISPLAY DEVICE INCLUDING THE SAME Non-Final OA Samsung Display Co., LTD.
18398398 DISPLAY DEVICE Non-Final OA LG Display Co., Ltd.
17935639 ARRANGEMENTS FOR MEMORY WITH ONE ACCESS TRANSISTOR FOR MULTIPLE CAPACITORS Final Rejection Intel Corporation
18840037 SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18839216 LIGHT RECEIVING DEVICE AND ELECTRONIC APPARATUS Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18440907 PARALLEL LINES FORMED BY ISOLATION CUT Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
18527799 STACKED NANOSHEET DEVICES WITH INTERFACIAL LAYERS Non-Final OA International Business Machines Corporation
18061701 NANOSHEET METAL-INSULATOR-METAL CAPACITOR Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
17992373 SEMICONDUCTOR STRUCTURE WITH STRAINED NANOSHEET CHANNEL Non-Final OA International Business Machines Corporation
17662859 INTERLEVEL VIA FOR STACKED FIELD-EFFECT TRANSISTOR DEVICE Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
18632840 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Non-Final OA DENSO CORPORATION
18789206 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18784667 GUARD RING STRUCTURE Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18656666 EPITAXIAL STRUCTURE FOR SEMICONDUCTOR DEVICES AND METHOD FORMING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17805109 SEMICONDUCTOR PACKAGE AND METHODS OF MANUFACTURING Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17825411 SEMICONDUCTOR DEVICE INCLUDING GRAPHENE BARRIER AND METHOD OF FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17722302 INTERCONNECT STRUCTURE AND METHODS OF FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17695839 SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
17586664 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17863647 SILICIDES, ALLOYS AND INTERMETALLICS TO MINIMIZE RESISTANCE Final Rejection Applied Materials, Inc.
17994007 Semiconductor structure and the forming method thereof Final Rejection UNITED MICROELECTRONICS CORP.
18083212 LIGHT EMITTING DEVICE AND LIGHT EMITTING MODULE Non-Final OA SEOUL VIOSYS CO., LTD.
18595013 COMPOSITE SUBSTRATE, SEMICONDUCTOR STRUCTURE, AND MANFUFACTURING METHOD FOR COMPOSITE SUBSTRATE Non-Final OA ENKRIS SEMICONDUCTOR, INC.

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