Prosecution Insights
Prosecution Insights
Tech Center 4100 • Art Units: 2818 4100
This examiner grants 85% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18423117 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18493122 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18351422 | SEMICONDUCTOR DEVICE INCLUDING SPACER STRUCTURE HAVING OXIDIZED REGION | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18191291 | SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18186849 | SEMICONDUCTOR DEVICE INCLUDING A FORROELECTRIC TRANSISTOR | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 17961688 | METHOD OF FABRICATING A SEMICONDUCTOR DEVICE INCLUDING CONTACT PLUG AND SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18769129 | IMAGE PICKUP ELEMENT, STACKED IMAGE PICKUP ELEMENT, AND SOLID IMAGE PICKUP APPARATUS | Final Rejection | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18257399 | SOLID-STATE IMAGING ELEMENT, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE | Non-Final OA | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18739591 | DISPLAY DEVICE | Non-Final OA | InnoLux Corporation |
| 18353211 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT | Non-Final OA | SK hynix Inc. |
| 18656969 | INTERCONNECT STRUCTURE AND METHOD FOR FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18596641 | SEMICONDUCTOR DEVICE, INTEGRATED CIRCUIT AND METHODS OF MANUFACTURING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18423215 | SEMICONDUCTOR STRUCTURE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18348741 | ELECTROSTATIC DISCHARGE IN GALLIUM NITRIDE DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18590111 | MICROWAVE ASSISTED PASSIVATION LAYER REMOVAL | Non-Final OA | Applied Materials, Inc. |
| 18378850 | SACRIFICIAL SOURCE/DRAIN FOR METALLIC SOURCE/DRAIN HORIZONTAL GATE ALL AROUND ARCHITECTURE | Final Rejection | Applied Materials, Inc. |
| 18423110 | SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | Kioxia Corporation |
| 18668639 | INTEGRATED CIRCUIT INCLUDING A CAPACITIVE STRUCTURE OF THE METAL-INSULATOR-METAL TYPE AND CORRESPONDING MANUFACTURING METHOD | Non-Final OA | STMicroelectronics (Rousset) SAS |
| 18380478 | AIR GAP STRUCTURE IN INTERCONNECT WITH TOP VIA | Final Rejection | International Business Machines Corporation |
| 18460610 | MEMORY DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | Winbond Electronics Corp. |
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