Prosecution Insights
Last updated: August 06, 2026

Foley & Lardner LLP - Tokyo Electron

15 pending office actions • 1 client • 14 examiners • 10 art units • 0 of 15 (0%) have an AI response strategy ready • 30 patents granted in the last 365 days

Quality Metrics (n=115484 apps, methodology: how we score firms)

87.0%
Allowance Rate
n=115484
+0.60σ
Allowance Rate (norm)
n=115484
3.2
OAs to Allowance
n=76842
-0.23σ
OAs to Allow (norm)
n=76842
1037 days
Time to Allowance
n=76842
+7.5pp
Interview Lift
n=115484
26.5%
RCE Rate
n=115484
1.7%
Appeal Rate
n=115484

Rejection Performance (% of received rejections ultimately overcome)

79.5%
§101 Overcome
n=10219
80.8%
§102 Overcome
n=29155
81.1%
§103 Overcome
n=46460
83.1%
§112 Overcome
n=29774

Specialization & Scale

G06F, A61K, G06Q
Top CPC Subclasses
13%
Top-3 CPC Share
n=115484
159
Practitioners
n=115484
726.3
Apps / Practitioner
n=115484

Portfolio Summary

15
Total Pending OAs
10
Non-Final OAs
3
Final Rejections
2
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 3 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

2
Overdue
0
Due this week
1
Due this month
0
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 3 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (2)Due ≤ 30 days (1)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

4
Hard (27%)
10
Medium (67%)
1
Easy (7%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§103 only6 (40%)
§102 only4 (27%)
§112 only1 (7%)
Multi-statute (no §101)4 (27%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

4
Life Sciences
27% of docket
1
Information Tech
7% of docket
0
Communications
0% of docket
9
Semiconductors
60% of docket
0
Mechanical / Eng
0% of docket
1
Business / Other
7% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

150 h
Manual time on pending OAs
30 h
Time saved (low, 20%)
52 h
Time saved (mid, 35%)
1.3 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
BOWEN, ADAM S 2 96.4% +2.4%
MATTABONI, TIMOTHY JAMES 1
NUCKOLS, TIFFANY Z 1 44.5% +39.8%
LAOBAK, ANDREW KEELAN 1 76.6% +30.8%
MEHTA, RATISHA 1 89.5% +5.7%
SANDVIK, BENJAMIN P 1 76.7% +6.2%
MILLER, JR, JOSEPH ALBERT 1 68.3% +16.2%
AHMED, SHAMIM 1 78.5% +22.1%
SCHATZ, CHRISTOPHER T 1 62.2% +26.6%
AUGUSTINE, NICHOLAS 1 73.0% +27.5%

Quick Wins (2)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.

App #TitleExaminerDue in
18597801 THREE-DIMENSIONAL FERROELECTRIC MEMORY DEVICE AND METHODS OF FABRICATING THE SAME BOWEN, ADAM S
18597779 3D FET DEVICES AND METHODS FOR MANUFACTURING THE SAME BOWEN, ADAM S

Hard Cases (4)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.

App #TitleExaminerDue in
18753777 METHOD AND APPARATUS FOR DAMASCENE ETCHING NUCKOLS, TIFFANY Z
18607202 HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS LAOBAK, ANDREW KEELAN
18598907 FERROELECTRIC 3D MEMORY BLOCK UNIT MEHTA, RATISHA
18530067 COMPLIANT CHUCK EDGE RING SCHATZ, CHRISTOPHER T

Interview Candidates (6)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.

App #TitleExaminerDue in
18424262 SELECTIVE ETCHING IN SEMICONDUCTOR DEVICES AHMED, SHAMIM 1d overdue
18753777 METHOD AND APPARATUS FOR DAMASCENE ETCHING NUCKOLS, TIFFANY Z
18607202 HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS LAOBAK, ANDREW KEELAN
18431887 PLASMA PROCESSING SYSTEM WITH DIRECT CURRENT SUPERPOSITION MILLER, JR, JOSEPH ALBERT
18530067 COMPLIANT CHUCK EDGE RING SCHATZ, CHRISTOPHER T
18389207 SYSTEM FOR PROCESS DEVELOPMENT ASSISTANCE AUGUSTINE, NICHOLAS

Client Portfolio (1 client)

Client (Assignee)Pending OAs
Tokyo Electron 15

Top Art Units

Art UnitApps
28973
17132
28122
17161
28171
28911
17461
21781
28991
28141

Pending Office Actions

App #TitleClientExaminerArt UnitStatutesStatusDue inAIFiled
18786164 METHODS FOR PROTECTING TO REUSE SILICON CARRIER WAFER BASED ON IR LASER LIFT-OFF PROCESS Tokyo Electron Limited MATTABONI, TIMOTHY JAMES §103 Non-Final OA Pending Jul 26, 2024
18753777 METHOD AND APPARATUS FOR DAMASCENE ETCHING Tokyo Electron Limited NUCKOLS, TIFFANY Z 1716 §102§103 Non-Final OA Pending Jun 25, 2024
18607202 HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS Tokyo Electron Limited LAOBAK, ANDREW KEELAN 1713 §102§103§112 Non-Final OA Pending Mar 15, 2024
18598907 FERROELECTRIC 3D MEMORY BLOCK UNIT Tokyo Electron Limited MEHTA, RATISHA 2817 §102§103 Non-Final OA Pending Mar 07, 2024
18597801 THREE-DIMENSIONAL FERROELECTRIC MEMORY DEVICE AND METHODS OF FABRICATING THE SAME Tokyo Electron Limited BOWEN, ADAM S 2897 §102 Non-Final OA Pending Mar 06, 2024
18597779 3D FET DEVICES AND METHODS FOR MANUFACTURING THE SAME Tokyo Electron Limited BOWEN, ADAM S 2897 §102 Non-Final OA Pending Mar 06, 2024
18586259 MIXED ACTIVATING AND REDUCING AGENT FOR BONDING Tokyo Electron Limited SANDVIK, BENJAMIN P 2812 §103 Non-Final OA Pending Feb 23, 2024
18431887 PLASMA PROCESSING SYSTEM WITH DIRECT CURRENT SUPERPOSITION Tokyo Electron Limited MILLER, JR, JOSEPH ALBERT 2891 §102 Final Rejection Pending Feb 02, 2024
18424262 SELECTIVE ETCHING IN SEMICONDUCTOR DEVICES Tokyo Electron Limited AHMED, SHAMIM 1713 §103 Non-Final OA 1d overdue Pending Jan 26, 2024
18530067 COMPLIANT CHUCK EDGE RING Tokyo Electron Limited SCHATZ, CHRISTOPHER T 1746 §102§103§112 Non-Final OA Pending Dec 05, 2023
18389207 SYSTEM FOR PROCESS DEVELOPMENT ASSISTANCE Tokyo Electron Limited AUGUSTINE, NICHOLAS 2178 §103 Non-Final OA Pending Nov 13, 2023
18373098 SHIFTED MULTI-VIA CONNECTION FOR HYBRID BONDING Tokyo Electron Limited PATEL, REEMA 2812 §103 Non-Final OA Pending Sep 26, 2023
17898104 METHODS FOR FORMING SEMICONDUCTOR DEVICES WITH ISOLATION STRUCTURES Tokyo Electron Limited KIM, SU C 2899 §102 Final Rejection 22d Pending Aug 29, 2022
17896961 PLASMA SURFACE TREATMENT FOR WAFER BONDING METHODS Tokyo Electron Limited KIM, JAHAE 2897 §103 Non-Final OA Pending Aug 26, 2022
17893736 METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY Tokyo Electron Limited BAIG, ANEESA RIAZ 2814 §112 Final Rejection 145d overdue Pending Aug 23, 2022

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