Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
5 pending office actions • 1 client • 5 examiners • 3 art units • 0 of 5 (0%) have an AI response strategy ready • 32 patents granted in the last 365 days
Foley & Lardner LLP - Tokyo Electron handles 5 pending office actions in the Chemistry & Materials technology area. The firm's career history includes 116888 applications. Across these 116888 career applications, the firm has achieved a resolved allowance rate of 87.01 percent. This 87.01 percent rate provides a success metric for its chemistry and materials prosecution. The 5 pending office actions represent the current workload.
The firm averages 3.23 office actions per allowance. This 3.23 average serves as a benchmark for the expected intensity of prosecution. The resolved allowance rate and the average office actions per allowance are based on the firm's 116888 career applications. These figures establish the firm's historical performance. Practitioners can use the 3.23 average office actions per allowance to estimate the effort required for the 5 pending matters.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (40%) |
| §102 only | 1 (20%) |
| §112 only | 1 (20%) |
| Multi-statute (no §101) | 1 (20%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| DUCLAIR, STEPHANIE P. | 1 | 72.3% | +19.6% |
| LAOBAK, ANDREW KEELAN | 1 | 75.8% | +34.7% |
| BOWEN, ADAM S | 1 | 96.5% | +2.3% |
| PHAM, THOMAS T | 1 | 51.4% | +15.7% |
| BAIG, ANEESA RIAZ | 1 | 93.8% | +7.9% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17893736 | METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY | BAIG, ANEESA RIAZ | 145d overdue |
| 18597762 | SYMMETRICAL 3D BIPOLAR NANOSHEET TRANSISTOR | BOWEN, ADAM S | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | LAOBAK, ANDREW KEELAN | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18433320 | DIRECT CURRENT SUPERPOSITION (DCS) FOR PROTECTION OF ORGANIC MANDREL DURING SPACER DEPOSITION | PHAM, THOMAS T | 27d |
| 18781793 | ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO | DUCLAIR, STEPHANIE P. | — |
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | LAOBAK, ANDREW KEELAN | — |
| Client (Assignee) | Pending OAs |
|---|---|
| Tokyo Electron | 5 |
| Art Unit | Apps |
|---|---|
| 1713 | 3 |
| 2897 | 1 |
| 2814 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18781793 | ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO | Tokyo Electron Limited | DUCLAIR, STEPHANIE P. | 1713 | §103 | Non-Final OA | — | Pending | Jul 23, 2024 |
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | Tokyo Electron Limited | LAOBAK, ANDREW KEELAN | 1713 | §102§103 | Final Rejection | — | Pending | Mar 15, 2024 |
| 18597762 | SYMMETRICAL 3D BIPOLAR NANOSHEET TRANSISTOR | Tokyo Electron Limited | BOWEN, ADAM S | 2897 | §102 | Non-Final OA | — | Pending | Mar 06, 2024 |
| 18433320 | DIRECT CURRENT SUPERPOSITION (DCS) FOR PROTECTION OF ORGANIC MANDREL DURING SPACER DEPOSITION | Tokyo Electron Limited | PHAM, THOMAS T | 1713 | §103 | Final Rejection | 27d | Pending | Feb 05, 2024 |
| 17893736 | METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY | Tokyo Electron Limited | BAIG, ANEESA RIAZ | 2814 | §112 | Final Rejection | 145d overdue | Pending | Aug 23, 2022 |
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Start Free Trial87.0% of resolved applications prosecuted by Foley & Lardner LLP - Tokyo Electron were allowed, across 116,888 applications in USPTO records.
3.23 office actions per allowed application on average.
5 pending office actions as of October 2026, for 1 client, before 5 examiners in 3 art units.