Prosecution Insights
Last updated: October 02, 2026

Examiner: GREWAL, HEIM KIRIN

Tech Center 2800 • Art Units: 2812

This examiner grants 90% of resolved cases

Analysis

Heim Kirin Grewal is an examiner in Tech Center 2800, assigned to Art Unit 2812. With 40 resolved cases, the data shows a very high allowance rate of 90.0%. This suggests that the vast majority of applications handled by this examiner eventually reach a grant. For practitioners, this 90.0% rate indicates a very favorable environment for patent prosecution in Art Unit 2812.

The interview lift is recorded at 2.0%, which is a relatively small increase. This 2.0% lift suggests that while interviews are available, they do not significantly alter the already high probability of allowance. Most cases appear to reach a successful conclusion through standard written prosecution. The median days to allowance is 1280, which provides a clear expectation for the duration of the process. These 1280 days represent the middle point of the timeline for applications that are granted. Overall, the statistics from Tech Center 2800 characterize the prosecution experience.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

90.2%
Allow Rate
+22.2% vs TC avg
63
Total Applications
+2.4%
Interview Lift
1275
Avg Prosecution Days
Based on 41 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
27.0%
§102 Novelty
55.8%
§103 Obviousness
14.2%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18756407 SEMICONDUCTOR DEVICE INCLUDING DIFFERENT INNER SPACERS Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18625295 IMAGE SENSOR Non-Final OA Samsung Electronics Co., Ltd.
17990448 ORGANIC LIGHT-EMITTING DISPLAY DEVICE Non-Final OA SAMSUNG DISPLAY CO., LTD.
17955187 SELF-ALIGNMENT LAYER WITH LOW-K MATERIAL PROXIMATE TO VIAS Final Rejection Intel Corporation
17829706 INTEGRATED CIRCUIT DEVICES WITH TRANSISTORS HAVING ANGLED GATES Final Rejection Intel Corporation
17482747 LOCALIZED HIGH PERMEABILITY MAGNETIC REGIONS IN GLASS PATCH FOR ENHANCED POWER DELIVERY Final Rejection Intel Corporation
18767944 MANAGING PERIPHERAL CIRCUITRIES IN SEMICONDUCTOR DEVICES Non-Final OA Yangtze Memory Technologies Co., Ltd.
18715846 LIGHT-RECEIVING DEVICE Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18512452 POWER GATING USING NANOELECTROMECHANICAL SYSTEMS (NEMS) IN BACK END OF LINE (BEOL) Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18149215 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17870341 CO-OPTIMIZATION OF MEMORY AND LOGIC DEVICES BY SOURCE/DRAIN MODULATION AND STRUCTURES THEREOF Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18198043 MEMORY DEVICE WITH HIGH-MOBILITY OXIDE SEMICONDUCTOR CHANNEL AND METHODS FOR FORMING THE SAME Final Rejection Applied Materials, Inc.
18756374 SEMICONDUCTOR DEVICE INCLUDING PAIRED MEMORY DEVICES Non-Final OA Sandisk Technologies, Inc.
18756352 LIGHT EMITTING MODULE HAVING LIGHT EMITTING DEVICE AND DISPLAY APPARATUS HAVING SAME Non-Final OA SEOUL VIOSYS CO., LTD.
18530100 ENHANCED AREA GETTER ARCHITECTURE FOR WAFER-LEVEL VACUUM PACKAGED UNCOOLED FOCAL PLANE ARRAY Non-Final OA DRS Network & Imaging Systems, LLC
18480750 MONOLITHIC OPTO-MOSFET RELAY AND MANUFACTURING METHOD THEREOF Non-Final OA Taiwan-Asia Semiconductor Corporation

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