Prosecution Insights
Last updated: August 18, 2026

Soitec

20 pending office actions • 11 art units • 20 examiners • 0 of 20 (0%) have an AI response strategy ready • 35 patents granted in the last 365 days

Portfolio Summary

20
Total Pending OAs
13
Non-Final OAs
7
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

0
Overdue
0
Due this week
3
Due this month
1
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Due ≤ 30 days (3)Due ≤ 60 days (1)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

8
Hard (40%)
11
Medium (55%)
1
Easy (5%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§103 only9 (45%)
§102 only2 (10%)
§112 only1 (5%)
Multi-statute (no §101)8 (40%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

4
Life Sciences
20% of docket
0
Information Tech
0% of docket
1
Communications
5% of docket
8
Semiconductors
40% of docket
0
Mechanical / Eng
0% of docket
7
Business / Other
35% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

200 h
Manual time on pending OAs
40 h
Time saved (low, 20%)
70 h
Time saved (mid, 35%)
1.8 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
TUROCY, DAVID P 1 46.9% +35.6%
RIVERA, JOSHEL 1 73.5% +6.7%
TURNER, BRIAN 1 83.2% +4.5%
KRUPICKA, ADAM C 1 61.9% +27.2%
KOCH, GEORGE R 1 72.8% +17.7%
ULLAH, ELIAS 1 84.9% +7.8%
ROBERTSON, NOAH CHRISTOPHER 1
ISAAC, STANETTA D 1 85.6% -36.9%
WOLDEGEORGIS, ERMIAS T 1 71.0% +12.4%
LOHAKARE, PRATIKSHA JAYANT 1 81.9% +15.5%

Quick Wins (3)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 3 ordered by deadline are shown.

App #TitleExaminerDue in
18834482 PROCESS FOR FABRICATING A DOUBLE SEMICONDUCTOR-ON-INSULATOR STRUCTURE TURNER, BRIAN
18727189 METHOD FOR TREATING SUBSTRATES ULLAH, ELIAS
18004594 SEMICONDUCTOR STRUCTURE COMPRISING AN ELECTRICALLY CONDUCTIVE BONDING INTERFACE, AND ASSOCIATED MANUFACTURING METHOD LOHAKARE, PRATIKSHA JAYANT

Hard Cases (8)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18248169 METHOD FOR PRODUCING A SUBSTRATE FOR EPITAXIAL GROWTH OF A GALLIUM-BASED III-N ALLOY LAYER GHYKA, ALEXANDER G 21d
18880143 PROCESS FOR FABRICATING A STRUCTURE COMPRISING A LAYER THAT ACTS AS A BARRIER TO DIFFUSION OF ATOMIC SPECIES TUROCY, DAVID P
18729023 METHOD FOR PRODUCING A DONOR SUBSTRATE FOR TRANSFERRING A PIEZOELECTRIC LAYER, AND METHOD FOR TRANSFERRING A PIEZOELECTRIC LAYER TO A CARRIER SUBSTRATE KOCH, GEORGE R
18722862 METHOD FOR FABRICATING A DONOR SUBSTRATE ROBERTSON, NOAH CHRISTOPHER
18722778 METHOD FOR MANUFACTURING DISASSEMBLABLE SUBSTRATES ISAAC, STANETTA D
18716376 METHOD FOR MANUFACTURING A 3D CIRCUIT WITH SHARED RECRYSTALLISATION AND DOPANT ACTIVATION STEPS WOLDEGEORGIS, ERMIAS T
18685991 METHOD FOR TRANSFERRING A USEFUL LAYER TO A FRONT FACE OF CARRIER SUBSTRATE SMITH JR., JIMMY R
18548616 METHOD FOR MANUFACTURING A SILICON-CARBIDE-BASED SEMICONDUCTOR STRUCTURE AND INTERMEDIATE COMPOSITE STRUCTURE JUNGE, BRYAN R.

Interview Candidates (5)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.

App #TitleExaminerDue in
18880143 PROCESS FOR FABRICATING A STRUCTURE COMPRISING A LAYER THAT ACTS AS A BARRIER TO DIFFUSION OF ATOMIC SPECIES TUROCY, DAVID P
18787009 STRUCTURE COMPRISING MONOCRYSTALLINE LAYERS OF ALN MATERIAL ON A SUBSTRATE AND SUBSTRATE FOR THE EPITAXIAL GROWTH OF MONOCRYSTALLINE LAYERS OF ALN MATERIAL KRUPICKA, ADAM C
18729023 METHOD FOR PRODUCING A DONOR SUBSTRATE FOR TRANSFERRING A PIEZOELECTRIC LAYER, AND METHOD FOR TRANSFERRING A PIEZOELECTRIC LAYER TO A CARRIER SUBSTRATE KOCH, GEORGE R
18716376 METHOD FOR MANUFACTURING A 3D CIRCUIT WITH SHARED RECRYSTALLISATION AND DOPANT ACTIVATION STEPS WOLDEGEORGIS, ERMIAS T
18004594 SEMICONDUCTOR STRUCTURE COMPRISING AN ELECTRICALLY CONDUCTIVE BONDING INTERFACE, AND ASSOCIATED MANUFACTURING METHOD LOHAKARE, PRATIKSHA JAYANT

Top Art Units

Art UnitApps
1745 2
2893 2
1718 1
1746 1
2897 1
2818 1
2812 1
2688 1
2898 1
2874 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
18880143 PROCESS FOR FABRICATING A STRUCTURE COMPRISING A LAYER THAT ACTS AS A BARRIER TO DIFFUSION OF ATOMIC SPECIES TUROCY, DAVID P 1718 §102§103 Final Rejection Pending Dec 30, 2024
18837681 COMPOSITE STRUCTURE AND MANUFACTURING METHOD THEREOF RIVERA, JOSHEL §102 Non-Final OA Pending Aug 12, 2024
18834482 PROCESS FOR FABRICATING A DOUBLE SEMICONDUCTOR-ON-INSULATOR STRUCTURE TURNER, BRIAN §112 Non-Final OA Pending Jul 30, 2024
18787009 STRUCTURE COMPRISING MONOCRYSTALLINE LAYERS OF ALN MATERIAL ON A SUBSTRATE AND SUBSTRATE FOR THE EPITAXIAL GROWTH OF MONOCRYSTALLINE LAYERS OF ALN MATERIAL KRUPICKA, ADAM C §103 Non-Final OA Pending Jul 29, 2024
18729023 METHOD FOR PRODUCING A DONOR SUBSTRATE FOR TRANSFERRING A PIEZOELECTRIC LAYER, AND METHOD FOR TRANSFERRING A PIEZOELECTRIC LAYER TO A CARRIER SUBSTRATE KOCH, GEORGE R 1745 §103§112 Non-Final OA Pending Jul 15, 2024
18727189 METHOD FOR TREATING SUBSTRATES ULLAH, ELIAS 2893 §102 Non-Final OA Pending Jul 08, 2024
18722862 METHOD FOR FABRICATING A DONOR SUBSTRATE ROBERTSON, NOAH CHRISTOPHER §103§112Other Non-Final OA Pending Jun 21, 2024
18722778 METHOD FOR MANUFACTURING DISASSEMBLABLE SUBSTRATES ISAAC, STANETTA D §102§103 Non-Final OA Pending Jun 21, 2024
18716376 METHOD FOR MANUFACTURING A 3D CIRCUIT WITH SHARED RECRYSTALLISATION AND DOPANT ACTIVATION STEPS WOLDEGEORGIS, ERMIAS T §103§112 Non-Final OA Pending Jun 04, 2024
18004594 SEMICONDUCTOR STRUCTURE COMPRISING AN ELECTRICALLY CONDUCTIVE BONDING INTERFACE, AND ASSOCIATED MANUFACTURING METHOD LOHAKARE, PRATIKSHA JAYANT §103 Non-Final OA Pending Apr 30, 2024
18685991 METHOD FOR TRANSFERRING A USEFUL LAYER TO A FRONT FACE OF CARRIER SUBSTRATE SMITH JR., JIMMY R 1745 §102§103 Final Rejection Pending Feb 23, 2024
18287148 METHOD OF MANUFACTURING A MULTILAYER STRUCTURE GROSS, CARSON 1746 §103 Final Rejection Pending Oct 16, 2023
18548616 METHOD FOR MANUFACTURING A SILICON-CARBIDE-BASED SEMICONDUCTOR STRUCTURE AND INTERMEDIATE COMPOSITE STRUCTURE JUNGE, BRYAN R. 2897 §103§112 Final Rejection Pending Sep 01, 2023
18263802 METHOD FOR PREPARING THE RESIDUE OF A DONOR SUBSTRATE, A LAYER OF WHICH HAS BEEN REMOVED BY DELAMINATION DEGRASSE, IAN ISAAC 2818 §103 Non-Final OA 23d Pending Aug 01, 2023
18248169 METHOD FOR PRODUCING A SUBSTRATE FOR EPITAXIAL GROWTH OF A GALLIUM-BASED III-N ALLOY LAYER GHYKA, ALEXANDER G 2812 §102§103 Final Rejection 21d Pending Apr 06, 2023
18042948 SURFACE ACOUSTIC WAVE SENSOR DEVICE FORMED ON A QUARTZ SUBSTRATE KLIMOWICZ, WILLIAM JOSEPH 2688 §103 Non-Final OA 55d Pending Feb 24, 2023
17758624 METHOD OF JOINING TWO SEMI-CONDUCTOR SUBSTRATES WILCZEWSKI, MARY A 2898 §103Other Non-Final OA Pending Jul 11, 2022
17757822 METHOD FOR MANUFACTURING A FULLY-DEPLETED SEMICONDUCTOR-ON-INSULATOR (FD_SOI) STRUCTURE INCLUDING HEAT-TREATING AN SOI SUBSTATE HAVING A P-TYPE MONOCRYSTALLINE SEMICONDUCTOR LAYER TO FORM A P-N JUNCTION BY DIFFUSION OF DOPANTS MAI, ANH D 2893 §103 Final Rejection 15d Pending Jun 21, 2022
17452197 METHOD FOR MANUFACTURING A SEMICONDUCTOR STRUCTURE CHU, CHRIS H 2874 §103 Non-Final OA Pending Oct 25, 2021
17417715 SEMICONDUCTOR STRUCTURE FOR DIGITAL AND RADIOFREQUENCY APPLICATIONS HRNJIC, ADIN 2817 §103 Final Rejection Pending Jun 23, 2021

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