Prosecution Insights
Last updated: October 02, 2026

Examiner: BEARDSLEY, JONAS TYLER

Tech Center 4100 • Art Units: 2811 4100

This examiner grants 61% of resolved cases

Analysis

Jonas Tyler Beardsley examines applications in Art Unit 2811 within Tech Center 4100. He has reached a final resolution in 289 cases, providing a solid basis for analyzing his prosecution trends. The allowance rate pct of 60.9 indicates a moderate success rate, where the majority of applications result in a patent grant. This 60.9 percent rate suggests that while success is achievable, applicants must be diligent in addressing examiner concerns. The median days to allowance is 1150, reflecting a prosecution timeline that typically involves a significant duration of examination. This 1150-day median indicates that practitioners should prepare for an extended period of examination in Tech Center 4100.

The interview lift pct of 28.5 is a key metric for developing a successful strategy. This substantial lift indicates that engaging in an interview is highly correlated with an increased probability of allowance compared to cases without verbal negotiation. By utilizing an interview, applicants can significantly improve their chances of success beyond the 60.9 percent baseline. Given the 289 resolved cases, this 28.5 percent lift is a reliable indicator that direct communication is an effective tool in Art Unit 2811. Practitioners should consider an interview as a primary tactic to overcome obstacles and potentially expedite the 1150-day median wait time. The data underscores the importance of proactive advocacy in this examination environment. Effectively leveraging the interview process can help move applications toward a favorable outcome more efficiently.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

60.9%
Allow Rate
+0.9% vs TC avg
329
Total Applications
+28.5%
Interview Lift
1150
Avg Prosecution Days
Based on 289 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
32.2%
§102 Novelty
46.6%
§103 Obviousness
20.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18753011 SEMICONDUCTOR PACKAGE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17827751 WIRING SUBSTRATE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR PACKAGE INCLUDING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
17914946 ARRAY SUBSTRATES AND METHODS FOR MANUFACTURING THE SAME, DISPLAY PANELS AND DISPLAY DEVICES Final Rejection BOE Technology Group Co., Ltd.
18669147 DISPLAY DEVICE Non-Final OA Samsung Display Co., LTD.
18596237 DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Display Co., LTD.
18589766 SEMICONDUCTOR DEVICE Non-Final OA KABUSHIKI KAISHA TOSHIBA
18821443 SEMICONDUCTOR DEVICE Non-Final OA Toshiba Electronic Devices & Storage Corporation
18361441 SEMICONDUCTOR DEVICE Non-Final OA Toshiba Electronic Devices & Storage Corporation
18413339 LIGHT-EMITTING DIODE DISPLAY APPARATUS Final Rejection LG Display Co., Ltd.
18503839 COMPLEMENTARY FIELD EFFECT TRANSISTOR (CFET) CIRCUITS WITH DIRECT VERTICAL CONNECTORS AND METHODS FOR MAKING THE SAME Final Rejection QUALCOMM Incorporated
18353908 RESISTIVE RANDOM ACCESS MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Final Rejection Kioxia Corporation
18405919 IMAGE SENSOR Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18528465 RESISTANCE REDUCTION BY FORMING CONDUCTIVE VIA ON BACK SIDE OF SOURCE/DRAIN CONTACTS Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18787996 FIELD EFFECT TRANSISTOR AND METHOD Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18780679 Dielectric Fins With Different Dielectric Constants and Sizes in Different Regions of a Semiconductor Device Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18404639 DIFFRACTION-BASED OVERLAY MARK DESIGN Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18237015 SEMICONDUCTOR DIE STUCTURE WITH AIR GAPS AND METHOD FOR PREPARING THE SAME Final Rejection NANYA TECHNOLOGY CORPORATION
18526546 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Non-Final OA Socionext Inc.
18625430 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Final Rejection FUJI ELECTRIC CO., LTD.
18357169 SEMICONDUCTOR DEVICE Non-Final OA FUJI ELECTRIC CO., LTD.
18521014 SILICON CARBIDE SUBSTRATE, SILICON CARBIDE WAFER, AND SILICON CARBIDE SEMICONDUCTOR DEVICE Non-Final OA MIRISE Technologies Corporation
18411911 ELECTRONIC DEVICES AND METHODS OF MANUFACTURING ELECTRONIC DEVICES Final Rejection Amkor Technology Singapore Holding Pte. Ltd.

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