Prosecution Insights
Last updated: October 02, 2026

Examiner: MCCOY, THOMAS WILSON

Tech Center 2800 • Art Units: 2814

This examiner grants 88% of resolved cases

Analysis

Thomas Wilson McCoy is an examiner in Tech Center 2800 and Art Unit 2814. Based on 32 resolved cases, the examiner has a high allowance rate of 87.5%. This suggests a very positive environment for applicants, as the vast majority of cases reach issuance. The 87.5% allowance rate indicates that the examiner is generally receptive to the arguments and claim sets presented in this art unit.

The interview lift is 11.0%, which shows that interviews provide a modest benefit in securing an allowance. While the baseline rate is already high, an interview can still be a useful tool for resolving final details. The median days to allowance is 1215, which is a typical duration for the prosecution process. This 1215-day timeline, combined with the 87.5% allowance rate, suggests a predictable path to issuance. For practitioners, the 32 resolved cases provide enough data to recommend a strategy focused on clear technical disclosure, with the 11.0% interview lift available as a secondary tactic to ensure success within the 1215-day median timeframe in Tech Center 2800.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

87.5%
Allow Rate
+19.5% vs TC avg
64
Total Applications
+11.0%
Interview Lift
1215
Avg Prosecution Days
Based on 32 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
15.9%
§102 Novelty
64.9%
§103 Obviousness
13.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18767490 DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE Non-Final OA Samsung Display Co., LTD.
18754254 IMAGING DEVICE Non-Final OA Panasonic Intellectual Property Management Co., Ltd.
18543987 METHOD FOR PRODUCING DOPED TRANSISTOR SOURCE AND DRAIN Non-Final OA COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
18217049 METHODS OF FORMING WAFER LEVEL MULTI-DIE SYSTEM FABRIC INTERCONNECT STRUCTURES Non-Final OA Intel Corporation
18216315 STACKED CHIPS WITH EDGE MOUNTED ANTENNAS FOR SMALL PITCH PHASED ARRAYS Non-Final OA Intel Corporation
17935627 INTEGRATED CIRCUIT DEVICES WITH ANGLED INTERCONNECTS Final Rejection Intel Corporation
17561824 STRESS ARREST LIP ON COPPER PAD FOR LOW ROUGHNESS COPPER Final Rejection Intel Corporation
18293044 SOLID-STATE IMAGING DEVICE Non-Final OA SONY GROUP CORPORATION
18549372 FLIP CONNECTION STRUCTURE, ROOM-TEMPERATURE FLIP CONNECTION STRUCTURE, AND CONNECTION METHOD THEREFOR Final Rejection SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18457664 ELECTRONIC COMPONENT WITH REDUCED STRESS Non-Final OA Murata Manufacturing Co., Ltd.
18524138 HOT ION IMPLANTATION FOR CONDENSATION DEFECT REDUCTION Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18244040 METHODS FOR FORMING GATE OXIDE LAYER FOR HIGH-VOLTAGE TRANSISTOR Final Rejection Taiwan Semiconductor Manufacturing Company LTD
18335754 METAL-INSULATOR-METAL STRUCTURE AND METHODS THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17685584 SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR FORMING THE SAME Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18403298 PACKAGED DEVICE WITH AIR GAP AND METHODS OF FORMING SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
17973641 WINDOW BALL GRIDE ARRAY (WBGA) PACKAGE STRUCTURE Final Rejection NANYA TECHNOLOGY CORPORATION
18512857 FERROELECTRIC BASED MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME Non-Final OA KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
18562058 COMPOUND SEMICONDUCTOR LAYERED STRUCTURES AND PROCESSES FOR MAKING THE SAME Non-Final OA UMICORE
18058932 STRUCTURE WITH COPPER BOND PAD AND COPPER INTERCONNECT Final Rejection GlobalFoundries Singapore Pte. Ltd.

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