Prosecution Insights
Last updated: October 02, 2026

Examiner: HAN, JONATHAN

Tech Center 2800 • Art Units: 2818

This examiner grants 84% of resolved cases

Analysis

Jonathan Han is an examiner in Art Unit 2818 within Tech Center 2800. The examiner has a high volume of 1285 resolved cases and an allowance rate of 83.8 percent. This large dataset suggests a very consistent and favorable environment for applicants. The 83.8 percent rate indicates that the vast majority of applications assigned to this examiner eventually reach an allowance.

The median time to allowance is 878 days. This duration reflects an efficient prosecution process, allowing applicants to secure patent rights relatively quickly. The 878-day figure provides a reliable benchmark for estimating the timeline from filing to grant in Art Unit 2818. Practitioners can use this median to help clients plan their intellectual property portfolios and commercialization schedules.

The interview lift for this examiner is 9.6 percent. While the allowance rate is already high at 83.8 percent, an interview still provides a measurable increase in the likelihood of success. The 9.6 percent lift suggests that direct communication can be a useful tool for resolving any remaining issues. Given the 1285 resolved cases, the data provides a high degree of confidence in these prosecution trends.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

83.8%
Allow Rate
+15.8% vs TC avg
1,303
Total Applications
+9.7%
Interview Lift
878
Avg Prosecution Days
Based on 1287 resolved cases, 2023–2026

Rejection Statute Breakdown

1.2%
§101 Eligibility
31.9%
§102 Novelty
55.6%
§103 Obviousness
9.2%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18769823 SEMICONDUCTOR PACKAGE Non-Final OA Samsung Electronics Co., Ltd.
18732941 IMAGE SENSORS AND METHODS OF FABRICATING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18610514 SEMICONDUCTOR DEVICE AND DATA STORAGE SYSTEM INCLUDING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18837612 Display Substrate, Preparation Method Therefor, and Display Apparatus Non-Final OA BOE Technology Group Co., Ltd.
18747741 DISPLAY DEVICE Non-Final OA Samsung Display Co., LTD.
18671005 SEMICONDUCTOR DEVICE Non-Final OA TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
18663477 METHOD FOR PRODUCING A POWER MODULE WITH SINTERED HEAT SINK Non-Final OA Robert Bosch GmbH
16803887 INTERPOSER HEAT SPREADER Non-Final OA Intel Corporation
18543663 FORKSHEET DEVICE WITH WRAPPED CONTACT Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
18822849 VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME Non-Final OA SK hynix Inc.
18782923 HYBRID WIRE SIZE DIAMETER UNDER ONE SINGLE DIE Non-Final OA Micron Technology, Inc.
18789988 METHOD OF MAKING SEMICONDUCTOR DEVICE Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18398937 PHOTONICS DEVICE WITH BACKSIDE TRANSMISSIVE REGION Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18835577 Method and Apparatus for Forming Backside Power Rails Non-Final OA Applied Materials, Inc.
18613525 MEMORY DEVICES AND METHODS OF FORMING THE SAME Non-Final OA Applied Materials, Inc.
18182856 DISPLAY PIXELS MADE FROM STACKED MICRO-LED STRUCTURES AND PHOTOLUMINESCENT MATERIALS Final Rejection Applied Materials, Inc.
18307173 APPLICATIONS OF TWO-DIMENSIONAL SILICON CARBIDE AS THE CHANNEL LAYER IN FIELD-EFFECT TRANSISTORS Final Rejection UNM RAINFOREST INNOVATIONS
18471003 Corrosion Resistant Metal Structures for Wide Bandgap Semiconductor Devices Non-Final OA Wolfspeed, Inc.
18908007 METHODS AND STRUCTURES FOR GENERATING SMOOTH ELECTRODES AND ELECTRODE STRUCTURES WITH A UNIFORMLY SMOOTH SURFACE Non-Final OA Qorvo US, Inc.
18675145 SEMICONDUCTOR DEVICE Non-Final OA FUJI ELECTRIC CO., LTD.
18730779 SYSTEM AND METHODS FOR MANUFACTURING A CRISSCROSS MATRIX OF SOLAR CELLS Non-Final OA SOLARWAT LTD.

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