Prosecution Insights
Prosecution Insights
37 pending office actions • 14 art units • 31 examiners • 0 of 37 (0%) have an AI response strategy ready • 34 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 11 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 11 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 15 (41%) |
| §102 only | 4 (11%) |
| Multi-statute (no §101) | 18 (49%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHU, JOHN S Y | 3 | 77.1% | +5.7% |
| MRUK, BRIAN P | 2 | 74.2% | +27.8% |
| EOFF, ANCA | 2 | 80.0% | +11.0% |
| MALLOY, ANNA E | 2 | 46.2% | -4.9% |
| ALANKO, ANITA KAREN | 2 | 69.7% | -17.3% |
| DAGENAIS, KRISTEN A | 1 | 63.6% | +20.2% |
| AHVAZI, BIJAN | 1 | 63.4% | +47.3% |
| RUMP, RICHARD M | 1 | 74.6% | +20.1% |
| LEE, DOUGLAS | 1 | 45.0% | +13.5% |
| ABU ALI, SHUANGYI | 1 | 45.4% | +37.9% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18179942 | RADIATION SHEET, HEAT DISSIPATION PLATE, HEAT DISSIPATION DEVICE AND CURABLE PASTE | FREEMAN, JOHN D | 8d overdue |
| 18260917 | PROTECTIVE FILM FORMING AGENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR CHIP | MALLOY, ANNA E | 4d overdue |
| 17638154 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING DEVICE, LEARNING DEVICE, INFORMATION PROCESSING METHOD, LEARNING METHOD, AND PROGRAM | WORKU, KIDEST | 72d |
| 17996704 | RADIO WAVE ABSORBER AND PASTE FOR FORMING RADIO WAVE ABSORBER | STANLEY, JANE L | 83d |
| 18993156 | PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | AHVAZI, BIJAN | — |
| 18730248 | WATER-REPELLING AGENT FOR ELECTROCONDUCTIVE ARTICLE SURFACE, WATER-REPELLENCY-IMPARTING METHOD FOR ELECTROCONDUCTIVE ARTICLE SURFACE, METHOD FOR SELECTIVELY IMPARTING WATER REPELLENCY FOR REGION HAVING ELECTROCONDUCTIVE ARTICLE SURFACE, SURFACE TREATMENT METHOD, AND METHOD FOR FORMING FILM ON SELECTED REGION OF SUBSTRATE SURFACE | ABU ALI, SHUANGYI | — |
| 18747824 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | MRUK, BRIAN P | — |
| 18680569 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | MRUK, BRIAN P | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19124533 | METHOD FOR MANUFACTURING PROCESSED SUBSTRATE, METHOD FOR PROCESSING SUBSTRATE, PATTERN FORMATION METHOD, AND CLEANING LIQUID | DAGENAIS, KRISTEN A | — |
| 18993156 | PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | AHVAZI, BIJAN | — |
| 18877518 | METAL OXIDE DISPERSON AND METHOD FOR MANUFACTURING METAL OXIDE FILM USING SAME | RUMP, RICHARD M | — |
| 18971492 | METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | LEE, DOUGLAS | — |
| 18730248 | WATER-REPELLING AGENT FOR ELECTROCONDUCTIVE ARTICLE SURFACE, WATER-REPELLENCY-IMPARTING METHOD FOR ELECTROCONDUCTIVE ARTICLE SURFACE, METHOD FOR SELECTIVELY IMPARTING WATER REPELLENCY FOR REGION HAVING ELECTROCONDUCTIVE ARTICLE SURFACE, SURFACE TREATMENT METHOD, AND METHOD FOR FORMING FILM ON SELECTED REGION OF SUBSTRATE SURFACE | ABU ALI, SHUANGYI | — |
| 18747824 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | MRUK, BRIAN P | — |
| 18680569 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | MRUK, BRIAN P | — |
| 18684046 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID-GENERATING AGENT, ACID DIFFUSION CONTROL AGENT, AND HIGH-MOLECULAR-WEIGHT COMPOUND | EOFF, ANCA | — |
| Art Unit | Apps |
|---|---|
| 1737 | 6 |
| 1761 | 5 |
| 1713 | 4 |
| 1764 | 3 |
| 1731 | 2 |
| 1765 | 2 |
| 1767 | 2 |
| 1717 | 1 |
| 1759 | 1 |
| 1714 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19124533 | METHOD FOR MANUFACTURING PROCESSED SUBSTRATE, METHOD FOR PROCESSING SUBSTRATE, PATTERN FORMATION METHOD, AND CLEANING LIQUID | DAGENAIS, KRISTEN A | 1717 | §103 | Non-Final OA | — | Pending | Apr 25, 2025 |
| 18993156 | PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | AHVAZI, BIJAN | — | §102§103Other | Non-Final OA | — | Pending | Jan 10, 2025 |
| 18877518 | METAL OXIDE DISPERSON AND METHOD FOR MANUFACTURING METAL OXIDE FILM USING SAME | RUMP, RICHARD M | 1759 | §102 | Non-Final OA | — | Pending | Dec 20, 2024 |
| 18971492 | METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | LEE, DOUGLAS | 1714 | §103 | Non-Final OA | — | Pending | Dec 06, 2024 |
| 18730248 | WATER-REPELLING AGENT FOR ELECTROCONDUCTIVE ARTICLE SURFACE, WATER-REPELLENCY-IMPARTING METHOD FOR ELECTROCONDUCTIVE ARTICLE SURFACE, METHOD FOR SELECTIVELY IMPARTING WATER REPELLENCY FOR REGION HAVING ELECTROCONDUCTIVE ARTICLE SURFACE, SURFACE TREATMENT METHOD, AND METHOD FOR FORMING FILM ON SELECTED REGION OF SUBSTRATE SURFACE | ABU ALI, SHUANGYI | 1731 | §102§112 | Final Rejection | — | Pending | Jul 18, 2024 |
| 18776834 | RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE | DARLING, DEVIN MITCHELL | 1764 | §103 | Non-Final OA | 5d overdue | Pending | Jul 18, 2024 |
| 18747824 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | MRUK, BRIAN P | 1761 | §102§112 | Non-Final OA | — | Pending | Jun 19, 2024 |
| 18680569 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | MRUK, BRIAN P | 1761 | §102§103 | Non-Final OA | — | Pending | May 31, 2024 |
| 18667524 | CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | DOUYON, LORNA M | 1761 | §102§103 | Non-Final OA | — | Pending | May 17, 2024 |
| 18659602 | ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | DEO, DUY VU NGUYEN | 1713 | §103 | Final Rejection | — | Pending | May 09, 2024 |
| 18659895 | CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | BERGNER, ERIN FLANAGAN | 1713 | §102 | Non-Final OA | — | Pending | May 09, 2024 |
| 18694174 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | NGUYEN, TRI V | 1764 | §102§103§112 | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18684046 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID-GENERATING AGENT, ACID DIFFUSION CONTROL AGENT, AND HIGH-MOLECULAR-WEIGHT COMPOUND | EOFF, ANCA | — | §102§103 | Non-Final OA | — | Pending | Feb 15, 2024 |
| 18433953 | AQUEOUS CLEANING LIQUID | PAUL, SHREYA | 1761 | §103 | Non-Final OA | — | Pending | Feb 06, 2024 |
| 18433969 | AQUEOUS CLEANING LIQUID | DELCOTTO, GREGORY R | 1761 | §103 | Final Rejection | 44d overdue | Pending | Feb 06, 2024 |
| 18681331 | CHIP FOR CELL CULTURING, DEVICE FOR CELL CULTURING, METHOD FOR MANUFACTURING CHIP FOR CELL CULTURING, AND METHOD FOR CULTURING CELLS | KWAK, DEAN P | — | §102§103 | Non-Final OA | — | Pending | Feb 05, 2024 |
| 18260917 | PROTECTIVE FILM FORMING AGENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR CHIP | MALLOY, ANNA E | 1737 | §102§103 | Final Rejection | 4d overdue | Pending | Dec 11, 2023 |
| 18568071 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | FRASER, STEWART A | — | §102 | Non-Final OA | — | Pending | Dec 07, 2023 |
| 18566338 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | EOFF, ANCA | — | §102§103 | Non-Final OA | — | Pending | Dec 01, 2023 |
| 18563358 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | WALKE, AMANDA C | — | §103 | Non-Final OA | — | Pending | Nov 21, 2023 |
| 18556281 | PHOTOCURABLE COMPOSITION | MCCLENDON, SANZA L | 1765 | §102§103 | Non-Final OA | — | Pending | Oct 19, 2023 |
| 18555306 | METAL-CONTAINING SILYLOXY COMPOUND, METAL-CONTAINING SILYLOXY GROUP-COATED PARTICLES, METHOD FOR PRODUCING SAME, AND DISPERSION COMPOSITION | HOU, FRANK S | 1692 | §102 | Non-Final OA | — | Pending | Oct 13, 2023 |
| 18546814 | PHOTOCURABLE LIQUID COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT | REDDY, KARUNA P | 1764 | §103§112Other | Final Rejection | — | Pending | Aug 17, 2023 |
| 18355899 | POLYMER AND TRIAZINE COMPOUND | DU, SURBHI M | 1765 | §103 | Non-Final OA | — | Pending | Jul 20, 2023 |
| 18339644 | CURABLE COMPOSITION | ROSWELL, JESSICA MARIE | 1767 | §103 | Non-Final OA | 47d | Pending | Jun 22, 2023 |
| 18258533 | PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMINATED FILM, AND METHOD FOR PRODUCING PATTERNED RESIST FILM | CHU, JOHN S Y | 1737 | §102§103 | Non-Final OA | — | Pending | Jun 20, 2023 |
| 18256899 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CHU, JOHN S Y | 1737 | §103§112 | Final Rejection | — | Pending | Jun 09, 2023 |
| 18254802 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MALLOY, ANNA E | 1737 | §103 | Final Rejection | 49d overdue | Pending | May 26, 2023 |
| 18320080 | ETCHANT COMPOSITION | ALANKO, ANITA KAREN | 1713 | §103§112 | Final Rejection | — | Pending | May 18, 2023 |
| 18191652 | SILICON ETCHANT AND SILICON ETCHING METHOD | ALANKO, ANITA KAREN | 1713 | §103 | Final Rejection | 15d | Pending | Mar 28, 2023 |
| 18179942 | RADIATION SHEET, HEAT DISSIPATION PLATE, HEAT DISSIPATION DEVICE AND CURABLE PASTE | FREEMAN, JOHN D | 1787 | §102§103 | Final Rejection | 8d overdue | Pending | Mar 07, 2023 |
| 17996704 | RADIO WAVE ABSORBER AND PASTE FOR FORMING RADIO WAVE ABSORBER | STANLEY, JANE L | 1767 | §103§112 | Non-Final OA | 83d | Pending | Oct 20, 2022 |
| 17759396 | RESIST PATTERN FORMATION METHOD | CHU, JOHN S Y | 1737 | §103 | Final Rejection | — | Pending | Jul 25, 2022 |
| 17805188 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | COSGROVE, JAYSON D | 1737 | §103 | Non-Final OA | 28d | Pending | Jun 02, 2022 |
| 17754049 | METHOD FOR SCREENING SECRETION-PRODUCING CELLS AND KIT FOR SCREENING SECRETION-PRODUCING CELLS | KOROTCHKINA, LIOUBOV G | 1653 | §103 | Final Rejection | — | Pending | Mar 22, 2022 |
| 17638154 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING DEVICE, LEARNING DEVICE, INFORMATION PROCESSING METHOD, LEARNING METHOD, AND PROGRAM | WORKU, KIDEST | 1758 | §102§103 | Non-Final OA | 72d | Pending | Feb 24, 2022 |
| 17644670 | SURFACE TREATMENT AGENT, SURFACE TREATMENT METHOD, AND REGION SELECTIVE FILM FORMATION METHOD FOR SURFACE OF SUBSTRATE | CASE, SARAH CATHERINE | 1731 | §103Other | Non-Final OA | 2d overdue | Pending | Dec 16, 2021 |
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