Prosecution Insights
Prosecution Insights
134 pending office actions • 42 art units • 73 examiners • 46 of 134 (34%) have an AI response strategy ready • 218 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 131 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 131 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 12 (9%) |
| §103 only | 89 (66%) |
| §102 only | 20 (15%) |
| §112 only | 8 (6%) |
| Double-patenting + other | 2 (1%) |
| No statute on record | 3 (2%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| WHITESELL, STEVEN H | 11 | 81.8% | +13.3% |
| KIM, PETER B | 7 | 82.8% | +9.1% |
| PERSAUD, DEORAM | 7 | 76.7% | +11.8% |
| ASFAW, MESFIN T | 5 | 82.7% | +14.2% |
| ANGEBRANNDT, MARTIN J | 5 | 55.2% | +34.5% |
| RIDDLE, CHRISTINA A | 4 | 80.8% | +13.7% |
| STOFFA, WYATT A | 4 | 79.9% | +22.4% |
| VANORE, DAVID A | 4 | 88.8% | +7.5% |
| NGUYEN, HUNG | 3 | 90.7% | +8.9% |
| SMITH, DAVID E | 3 | 84.9% | +7.3% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17277583 | METROLOGY METHOD AND APPARATUS THEREFOR | WHITESELL, STEVEN H | 118d overdue |
| 18714547 | OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING | NGUYEN, HUNG | 111d overdue |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | WHITESELL, STEVEN H | 88d overdue |
| 18294202 | AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC APPARATUS | WHITESELL, STEVEN H | 72d overdue |
| 18705509 | DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION | ASFAW, MESFIN T | 60d overdue |
| 18690979 | METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES | ASFAW, MESFIN T | 56d overdue |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | KIM, PETER B | 53d overdue |
| 18025183 | TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS | WHITESELL, STEVEN H | 51d overdue |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18017646 | APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMAGES AUTOMATICALLY | HELCO, NICHOLAS JOHN | 79d overdue |
| 17874582 | COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL | WHITESELL, STEVEN H | 66d overdue |
| 18718009 | METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A SUBSTRATE EXPOSED BY A LITHOGRAPHIC APPARATUS | WHITESELL, STEVEN H | 30d overdue |
| 18690871 | OUT-OF-BAND LEAKAGE CORRECTION METHOD AND METROLOGY APPARATUS | PERSAUD, DEORAM | 26d overdue |
| 18277223 | METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS | PERSAUD, DEORAM | 19d overdue |
| 18630741 | SEM IMAGE ALIGNMENT | DIGUGLIELMO, DANIELLA MARIE | 8d overdue |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | PERSAUD, DEORAM | 12d |
| 18281614 | METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS | PERSAUD, DEORAM | 22d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17277583 | METROLOGY METHOD AND APPARATUS THEREFOR | WHITESELL, STEVEN H | 118d overdue |
| 17607701 | A PATTERNING DEVICE | ANGEBRANNDT, MARTIN J | 103d overdue |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | WHITESELL, STEVEN H | 88d overdue |
| 18294202 | AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC APPARATUS | WHITESELL, STEVEN H | 72d overdue |
| 17874582 | COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL | WHITESELL, STEVEN H | 66d overdue |
| 18705509 | DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION | ASFAW, MESFIN T | 60d overdue |
| 18690979 | METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES | ASFAW, MESFIN T | 56d overdue |
| 18025183 | TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS | WHITESELL, STEVEN H | 51d overdue |
| Art Unit | Apps |
|---|---|
| 2882 | 26 |
| 2881 | 15 |
| 2877 | 12 |
| 1759 | 11 |
| 2878 | 10 |
| 1737 | 5 |
| 2851 | 5 |
| 2668 | 3 |
| 2665 | 3 |
| 2188 | 3 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18874533 | HIGH-THROUGHPUT LOAD LOCK CHAMBER | TIETJEN, MARINA ANNETTE | 3799 | §103 | Non-Final OA | 14d | AI Ready | Dec 12, 2024 |
| 18863941 | CONTAMINATION DETERMINATION | KIM, PETER B | 2882 | §103 | Non-Final OA | 34d | Pending | Nov 07, 2024 |
| 18908931 | Imprint Apparatus with Movable Stages | CHIDIAC, NICHOLAS J | 1744 | DPOther | Non-Final OA | 76d | AI Ready | Oct 08, 2024 |
| 18848085 | A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SUBSTRATE AND ASSOCIATED APPARATUSES | AHMED, JAMIL | 2877 | §102 | Non-Final OA | 9d overdue | AI Ready | Sep 17, 2024 |
| 18848095 | ILLUMINATION ARRANGEMENT FOR A METROLOGY DEVICE AND ASSOCIATED METHOD | AMARA, MOHAMED K | 2877 | §102 | Non-Final OA | 22d | AI Ready | Sep 17, 2024 |
| 18844757 | METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES | ASFAW, MESFIN T | 2882 | §102 | Non-Final OA | 27d | AI Ready | Sep 06, 2024 |
| 18844478 | SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES | ASFAW, MESFIN T | 2882 | §102 | Non-Final OA | 30d | Pending | Sep 06, 2024 |
| 18843936 | METHOD FOR DETERMINING A SPATIAL DISTRIBUTION OF A PARAMETER OF INTEREST OVER AT LEAST ONE SUBSTRATE OR PORTION THEREOF | ASFAW, MESFIN T | 2882 | §102 | Non-Final OA | 28d | Pending | Sep 04, 2024 |
| 18844043 | DATA RETRIEVAL | UDDIN, MOHAMMED R | 2161 | §103 | Final Rejection | 110d overdue | Pending | Sep 04, 2024 |
| 18842640 | APPARATUS AND METHODS FOR FILTERING MEASUREMENT RADIATION | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 9d overdue | AI Ready | Aug 29, 2024 |
| 18838135 | INSPECTION TOOL AND BARRIER FOR USE THEREIN | HANSEN, JONATHAN M | 2877 | §103 | Non-Final OA | 9d | AI Ready | Aug 13, 2024 |
| 18802614 | DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERSE IMAGES OF AN OBJECT | RAHMAN, MD M | 2877 | §103 | Non-Final OA | 63d | AI Ready | Aug 13, 2024 |
| 18800925 | ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT | WHITESELL, STEVEN H | 1759 | §112 | Non-Final OA | 19d overdue | AI Ready | Aug 12, 2024 |
| 18835287 | INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND | KIM, PETER B | 2882 | §103 | Non-Final OA | 11d overdue | Pending | Aug 01, 2024 |
| 18728004 | METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT | AHMED, JAMIL | 2877 | §103 | Non-Final OA | 31d overdue | Pending | Jul 10, 2024 |
| 18749556 | COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME | PERSAUD, DEORAM | 2882 | §101 | Non-Final OA | 43d | Pending | Jun 20, 2024 |
| 18721251 | A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS | RIDDLE, CHRISTINA A | 2882 | §103 | Final Rejection | 84d | Pending | Jun 18, 2024 |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | KIM, PETER B | 2882 | §103 | Non-Final OA | 53d overdue | Pending | Jun 14, 2024 |
| 18718009 | METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A SUBSTRATE EXPOSED BY A LITHOGRAPHIC APPARATUS | WHITESELL, STEVEN H | 1759 | §101 | Non-Final OA | 30d overdue | Pending | Jun 07, 2024 |
| 18716806 | MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 24d overdue | Pending | Jun 05, 2024 |
| 18716383 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | KIM, PETER B | 2882 | §103 | Non-Final OA | 43d overdue | Pending | Jun 04, 2024 |
| 18714728 | SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES USING IMAGE-BASED FAILURE RATE MODEL | KIM, PETER B | 2882 | §102 | Non-Final OA | 36d overdue | Pending | May 30, 2024 |
| 18714547 | OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING | NGUYEN, HUNG | 2882 | §103 | Non-Final OA | 111d overdue | Pending | May 29, 2024 |
| 18713108 | CHARGED-PARTICLE BEAM APPARATUS FOR VOLTAGE-CONTRAST INSPECTION AND METHODS THEREOF | NAVARRO, HUGO IVAN | 2858 | §103 | Non-Final OA | 45d overdue | AI Ready | May 23, 2024 |
| 18712464 | SYSTEMS AND STRUCTURES FOR VENTING AND FLOW CONDITIONING OPERATIONS IN INSPECTION SYSTEMS | SHAH, NEEL D | 2858 | §102 | Non-Final OA | 32d overdue | AI Ready | May 22, 2024 |
| 18712671 | SURROUNDING PATTERN AND PROCESS AWARE METROLOGY | PERSAUD, DEORAM | 2882 | §102 | Non-Final OA | 38d overdue | Pending | May 22, 2024 |
| 18711842 | APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE | NGUYEN, HUNG | 2882 | §103 | Non-Final OA | — | Pending | May 20, 2024 |
| 18710127 | SYSTEMS AND METHODS FOR DEFECT DETECTION AND DEFECT LOCATION IDENTIFICATION IN A CHARGED PARTICLE SYSTEM | ALAVI, AMIR | 2668 | §103 | Non-Final OA | 3d overdue | AI Ready | May 14, 2024 |
| 18709792 | VALVES WITH REDUCED PARTICLE GENERATION AND INCREASED CYCLE LIFE | BASTIANELLI, JOHN | 3753 | §103 | Non-Final OA | 56d | AI Ready | May 13, 2024 |
| 18705509 | DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION | ASFAW, MESFIN T | 2882 | §102 | Non-Final OA | 60d overdue | Pending | Apr 26, 2024 |
| 18630741 | SEM IMAGE ALIGNMENT | DIGUGLIELMO, DANIELLA MARIE | 2666 | §101 | Non-Final OA | 8d overdue | AI Ready | Apr 09, 2024 |
| 18699358 | LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS | RIDDLE, CHRISTINA A | 2882 | §103 | Final Rejection | 28d | Pending | Apr 08, 2024 |
| 18618957 | CHARGED PARTICLE APPARATUS AND METHOD | WANG, JING | 2881 | §103 | Non-Final OA | 13d | AI Ready | Mar 27, 2024 |
| 18618406 | PELLICLE FOR EUV LITHOGRAPHY | ANGEBRANNDT, MARTIN J | 1737 | §103 | Non-Final OA | 31d overdue | Pending | Mar 27, 2024 |
| 18617149 | METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION | ANGEBRANNDT, MARTIN J | 1737 | §103 | Non-Final OA | 30d overdue | Pending | Mar 26, 2024 |
| 18611689 | BEAM GRID LAYOUT | WHITTINGTON, KENNETH | 3992 | Other | Final Rejection | 36d | AI Ready | Mar 20, 2024 |
| 18691002 | SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES | MENDOZA, ALEXANDRIA ARELLANO | 2877 | §103 | Final Rejection | 121d overdue | Pending | Mar 11, 2024 |
| 18690871 | OUT-OF-BAND LEAKAGE CORRECTION METHOD AND METROLOGY APPARATUS | PERSAUD, DEORAM | 2882 | §101 | Final Rejection | 26d overdue | Pending | Mar 11, 2024 |
| 18690979 | METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES | ASFAW, MESFIN T | 2882 | §103 | Final Rejection | 56d overdue | Pending | Mar 11, 2024 |
| 18686742 | METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD | STOCK JR, GORDON J | 2877 | §102 | Non-Final OA | 42d overdue | Pending | Feb 26, 2024 |
| 18684391 | COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF | STOCK JR, GORDON J | 2877 | §103 | Non-Final OA | 43d overdue | Pending | Feb 16, 2024 |
| 18683389 | SENSOR SYSTEM | UNDERWOOD, JARREAS C | 2877 | §103 | Final Rejection | 53d | Pending | Feb 13, 2024 |
| 18294202 | AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC APPARATUS | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 72d overdue | Pending | Feb 01, 2024 |
| 18415596 | ALIGNING A DISTORTED IMAGE | RODIN, MARIO ANTHONY | 2675 | §103 | Non-Final OA | 19d | AI Ready | Jan 17, 2024 |
| 18578780 | APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT | RIDDLE, CHRISTINA A | 2882 | §112 | Final Rejection | 2d overdue | Pending | Jan 12, 2024 |
| 18577678 | IMAGE DISTORTION CORRECTION IN CHARGED PARTICLE INSPECTION | LAM, ANDREW H | 2682 | §103 | Non-Final OA | 40d | AI Ready | Jan 08, 2024 |
| 18577684 | METHOD AND SYSTEM FOR ANOMALY-BASED DEFECT INSPECTION | BAKER, CHARLOTTE M | 2664 | §103 | Non-Final OA | 9d overdue | AI Ready | Jan 08, 2024 |
| 18407323 | METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR MANUFACTURING | CHOI, ALICIA M | 2117 | §101 | Non-Final OA | — | Pending | Jan 08, 2024 |
| 18397896 | CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE IN A CHARGED PARTICLE ASSESSMENT SYSTEM | STOFFA, WYATT A | 2881 | §102 | Non-Final OA | 31d overdue | AI Ready | Dec 27, 2023 |
| 18571118 | METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMETER IN A SEMICONDUCTOR MANUFACTURING PROCESS | YANCHUS III, PAUL B | 2115 | §103 | Non-Final OA | 1d overdue | Pending | Dec 15, 2023 |
| 18570140 | STRUCTURES FOR USE ON A SUBSTRATE HOLDER, SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS AND METHOD | KIM, PETER B | 2882 | §103 | Final Rejection | 8d | Pending | Dec 14, 2023 |
| 18568628 | CHARGED PARTICLE DETECTOR ASSEMBLY | SMITH, DAVID E | 2881 | §103 | Non-Final OA | 42d overdue | Pending | Dec 08, 2023 |
| 18567053 | METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS | PERSAUD, DEORAM | 2882 | §101 | Final Rejection | 28d | Pending | Dec 05, 2023 |
| 18565951 | INSPECTION DATA FILTERING SYSTEMS AND METHODS | BHATNAGAR, ANAND P | 2668 | §102 | Non-Final OA | 100d overdue | Pending | Nov 30, 2023 |
| 18515952 | Transport System Having a Magnetically Levitated Transportation Stage | WHITESELL, STEVEN H | 1759 | §103 | Final Rejection | 1d overdue | Pending | Nov 21, 2023 |
| 18516020 | DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD | SMITH, DAVID E | 2881 | §103 | Final Rejection | 83d | AI Ready | Nov 21, 2023 |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 88d overdue | Pending | Nov 16, 2023 |
| 18384791 | CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD | MCCORMACK, JASON L | 2881 | §103 | Final Rejection | 3d overdue | AI Ready | Oct 27, 2023 |
| 18287160 | OPTICAL ELEMENT FOR GENERATION OF BROADBAND RADIATION | WONG, ERIC K | 2874 | §102 | Final Rejection | 29d overdue | Pending | Oct 16, 2023 |
| 18286327 | METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL | NGUYEN, HUNG | 2882 | §103 | Non-Final OA | 12d | AI Ready | Oct 10, 2023 |
| 18478771 | ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL SYSTEM | VANORE, DAVID A | 2878 | §102 | Non-Final OA | 43d overdue | AI Ready | Sep 29, 2023 |
| 18284839 | ON SYSTEM SELF-DIAGNOSIS AND SELF-CALIBRATION TECHNIQUE FOR CHARGED PARTICLE BEAM SYSTEMS | VANORE, DAVID A | 2878 | §112 | Non-Final OA | 28d | AI Ready | Sep 28, 2023 |
| 18369775 | SEM IMAGE ENHANCEMENT | LU, ZHIYU | 2665 | §103 | Non-Final OA | 24d overdue | AI Ready | Sep 18, 2023 |
| 18369619 | FLOOD COLUMN AND CHARGED PARTICLE APPARATUS | CHOI, JAMES J | 2878 | §103 | Final Rejection | 83d | AI Ready | Sep 18, 2023 |
| 18281614 | METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS | PERSAUD, DEORAM | 2882 | §101 | Final Rejection | 22d | Pending | Sep 12, 2023 |
| 18280917 | TARGET MATERIAL TRANSFER SYSTEM COMPONENTS AND METHODS OF MAKING THE SAME | CHANG, HANWAY | 2878 | §103 | Non-Final OA | 6d | Pending | Sep 07, 2023 |
| 18279121 | ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES | WHITESELL, STEVEN H | 1759 | §103 | Final Rejection | 42d overdue | Pending | Aug 28, 2023 |
| 18277223 | METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS | PERSAUD, DEORAM | 2882 | §101 | Final Rejection | 19d overdue | Pending | Aug 14, 2023 |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | PERSAUD, DEORAM | 2882 | §101 | Final Rejection | 12d | Pending | Aug 11, 2023 |
| 18276018 | A MACHINE LEARNING MODEL USING TARGET PATTERN AND REFERENCE LAYER PATTERN TO DETERMINE OPTICAL PROXIMITY CORRECTION FOR MASK | SALEH, ZAID MUHAMMAD | 2668 | §102 | Non-Final OA | 14d | Pending | Aug 04, 2023 |
| 18365130 | PATTERN GROUPING METHOD BASED ON MACHINE LEARNING | BALI, VIKKRAM | 2663 | DPOther | Final Rejection | — | AI Ready | Aug 03, 2023 |
| 18270707 | DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS | VANORE, DAVID A | 2878 | §112 | Final Rejection | 29d | AI Ready | Jun 30, 2023 |
| 18270074 | MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIMATION | CAMPOS, ALFREDO | 2129 | §103 | Non-Final OA | 35d | AI Ready | Jun 28, 2023 |
| 18259344 | MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIMATION | ALSHAHARI, SADIK AHMED | 2121 | §103 | Non-Final OA | 1d overdue | AI Ready | Jun 26, 2023 |
| 18268847 | A METROLOGY APPARATUS AND A METROLOGY METHOD | OKASHA, RAMI RAFAT | 2118 | §103 | Non-Final OA | 38d overdue | Pending | Jun 21, 2023 |
| 18268924 | DATA-DRIVEN PREDICTION AND IDENTIFICATION OF FAILURE MODES BASED ON WAFER-LEVEL ANALYSIS AND ROOT CAUSE ANALYSIS FOR SEMICONDUCTOR PROCESSING | SAFAIPOUR, BOBBAK | 2665 | §103 | Non-Final OA | 14d | AI Ready | Jun 21, 2023 |
| 18268953 | MACHINE LEARNING-BASED SYSTEMS AND METHODS FOR GENERATING SYNTHETIC DEFECT IMAGES FOR WAFER INSPECTION | DHOOGE, DEVIN J | 2677 | §103 | Final Rejection | 50d | Pending | Jun 21, 2023 |
| 18209445 | CHARGED PARTICLE SYSTEM, METHOD OF PROCESSING A SAMPLE USING A MULTI-BEAM OF CHARGED PARTICLES | CHOI, JAMES J | 2878 | §103 | Non-Final OA | 44d overdue | AI Ready | Jun 13, 2023 |
| 18331866 | APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A SAMPLE | SMITH, DAVID E | 2881 | §103 | Non-Final OA | 54d | AI Ready | Jun 08, 2023 |
| 18206887 | MEMBRANE CLEANING APPARATUS | BERGNER, ERIN FLANAGAN | 1713 | §103 | Non-Final OA | 46d overdue | Pending | Jun 07, 2023 |
| 18327847 | CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD | VANORE, DAVID A | 2878 | §112 | Final Rejection | 70d | AI Ready | Jun 01, 2023 |
| 18039712 | A METHOD OF MONITORING A LITHOGRAPHIC PROCESS | LE, JOHN H | 2857 | §102 | Non-Final OA | 5d | Pending | May 31, 2023 |
| 18039487 | METHODS AND APPARATUS FOR PROVIDING A BROADBAND LIGHT SOURCE | STAHL, MICHAEL J | 2874 | §102 | Final Rejection | 70d | Pending | May 30, 2023 |
| 18039484 | LITHOGRAPHIC METHOD | KIM, PETER B | 2882 | §112 | Non-Final OA | 17d overdue | Pending | May 30, 2023 |
| 18203172 | INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER SOURCE OF AN INTERFEROMETER SYSTEM, METHOD OF DETERMINING A POSITION OF A MOVABLE OBJECT, AND LITHOGRAPHIC APPARATUS | LYONS, MICHAEL A | 2877 | §103 | Non-Final OA | 8d overdue | Pending | May 30, 2023 |
| 18039483 | MACHINE LEARNING BASED IMAGE GENERATION OF AFTER-DEVELOPMENT OR AFTER-ETCH IMAGES | LIU, XIAO | 2664 | §103 | Final Rejection | 16d overdue | Pending | May 30, 2023 |
| 18038206 | SEMICONDUCTOR CHARGED PARTICLE DETECTOR FOR MICROSCOPY | STOFFA, WYATT A | 2881 | §112 | Final Rejection | 71d | Pending | May 22, 2023 |
| 18320157 | INSPECTION METHOD AND INSPECTION TOOL | MCCORMACK, JASON L | 2881 | §103 | Non-Final OA | 14d | AI Ready | May 18, 2023 |
| 18032273 | METHODS AND COMPUTER PROGRAMS FOR CONFIGURATION OF A SAMPLING SCHEME GENERATION MODEL | SALOMON, PHENUEL S | 2146 | §103 | Non-Final OA | 32d overdue | Pending | Apr 17, 2023 |
| 18031865 | METHOD FOR GENERATING MASK PATTERN | LEE, ERIC D | 2851 | §102 | Non-Final OA | 36d overdue | Pending | Apr 13, 2023 |
| 18134020 | APERTURE PATTERNS FOR DEFINING MULTI-BEAMS | CHOI, JAMES J | 2878 | §103 | Non-Final OA | 30d overdue | AI Ready | Apr 12, 2023 |
| 18025636 | VACUUM SYSTEM FOR MITIGATING DAMAGE DUE TO A VACUUM PUMP MALFUNCTION | COMLEY, ALEXANDER BRYANT | 3746 | §102 | Final Rejection | 3d overdue | Pending | Mar 09, 2023 |
| 18025183 | TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 51d overdue | Pending | Mar 07, 2023 |
| 18023708 | METHOD OF PERFORMING METROLOGY, METHOD OF TRAINING A MACHINE LEARNING MODEL, METHOD OF PROVIDING A LAYER COMPRISING A TWO-DIMENSIONAL MATERIAL, METROLOGY APPARATUS | DINH, LYNDA | 2857 | §103 | Non-Final OA | 50d overdue | Pending | Feb 27, 2023 |
| 18111503 | SYSTEM AND METHOD FOR ALIGNING ELECTRON BEAMS IN MULTI-BEAM INSPECTION APPARATUS | STOFFA, WYATT A | 2881 | §103 | Non-Final OA | 37d overdue | AI Ready | Feb 17, 2023 |
| 18018578 | SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION IN AN INSPECTION APPARATUS | MCCORMACK, JASON L | 2881 | §103 | Final Rejection | 70d | AI Ready | Jan 29, 2023 |
| 18017646 | APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMAGES AUTOMATICALLY | HELCO, NICHOLAS JOHN | 2667 | §101 | Final Rejection | 79d overdue | Pending | Jan 23, 2023 |
| 18016811 | METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCTOR FAB | GASSEN, CHRISTOPHER J | 2881 | §103 | Final Rejection | 43d overdue | Pending | Jan 18, 2023 |
| 18015313 | APPARATUS AND METHOD FOR SELECTING INFORMATIVE PATTERNS FOR TRAINING MACHINE LEARNING MODELS | LU, ZHIYU | 2665 | §103 | Final Rejection | 84d | Pending | Jan 09, 2023 |
| 18150745 | CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COLUMN ARRAY, INSPECTION METHOD | CHANG, HANWAY | 2878 | §103 | Final Rejection | 75d | AI Ready | Jan 05, 2023 |
| 18014431 | METHOD OF DETERMINING A CORRECTION STRATEGY IN A SEMICONDUCTOR MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES | PAN, YUHUI R | 2116 | §103 | Final Rejection | 13d | Pending | Jan 04, 2023 |
| 18011593 | APPARATUS FOR AND METHOD OF ACCELERATING DROPLETS IN A DROPLET GENERATOR FOR AN EUV SOURCE | CHANG, HANWAY | 2878 | §103 | Non-Final OA | 12d | Pending | Dec 20, 2022 |
| 18064110 | REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS | OSENBAUGH-STEWART, ELIZA W | 2881 | §103 | Non-Final OA | 2d overdue | AI Ready | Dec 09, 2022 |
| 18008075 | SYSTEMS, METHODS, AND PRODUCTS FOR DETERMINING PRINTING PROBABILITY OF ASSIST FEATURE AND ITS APPLICATION | WALKE, AMANDA C | 1722 | §103 | Final Rejection | 15d overdue | Pending | Dec 02, 2022 |
| 17986829 | APPARATUS FOR DECOMPOSING ERROR CONTRIBUTIONS FROM MULTIPLE SOURCES TO MULTIPLE FEATURES OF A PATTERN ON A SUBSTRATE | ISLAM, MEHRAZUL NMN | 2662 | §103 | Final Rejection | 28d | AI Ready | Nov 14, 2022 |
| 17924626 | SYSTEMS, PRODUCTS, AND METHODS FOR GENERATING PATTERNING DEVICES AND PATTERNS THEREFOR | ALAWDI, ANWER AHMED | 2851 | §103 | Non-Final OA | 53d overdue | Pending | Nov 10, 2022 |
| 17924543 | VERIFYING FREEFORM CURVILINEAR FEATURES OF A MASK DESIGN | GARBOWSKI, LEIGH M | 2851 | §103 | Non-Final OA | 56d overdue | Pending | Nov 10, 2022 |
| 17922768 | OPTICAL ELEMENT AND PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS | ANGEBRANNDT, MARTIN J | 1737 | §103 | Final Rejection | 28d | Pending | Nov 01, 2022 |
| 17922580 | SUBSTRATE SUPPORT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF EXPOSING A SUBSTRATE | RIDDLE, CHRISTINA A | 2882 | §103 | Final Rejection | 55d | Pending | Oct 31, 2022 |
| 17961247 | APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS | STOFFA, WYATT A | 2881 | §103 | Non-Final OA | 2d overdue | AI Ready | Oct 06, 2022 |
| 17799806 | SYSTEMS AND METHODS FOR PROCESS METRIC AWARE PROCESS CONTROL | PATEL, DHRUVKUMAR | 2119 | §103 | Final Rejection | 9d overdue | Pending | Aug 15, 2022 |
| 17798538 | CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD | OSENBAUGH-STEWART, ELIZA W | 2881 | §103 | Final Rejection | 5d | Pending | Aug 09, 2022 |
| 17796641 | METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A SUBSTRATE | RUSH, ERIC | 2677 | §103 | Non-Final OA | 31d overdue | AI Ready | Jul 29, 2022 |
| 17796434 | DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE | ALAWDI, ANWER AHMED | 2851 | §103 | Final Rejection | 125d overdue | Pending | Jul 29, 2022 |
| 17874582 | COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL | WHITESELL, STEVEN H | 1759 | §101 | Final Rejection | 66d overdue | Pending | Jul 27, 2022 |
| 17794435 | CHARGED PARTICLE MANIPULATOR DEVICE | OSENBAUGH-STEWART, ELIZA W | 2881 | §103 | Final Rejection | 72d overdue | Pending | Jul 21, 2022 |
| 17869550 | SYSTEM AND METHOD USING A SET OF MULTI-STEP DEFECT DETECTION TESTS WITH DIFFERENT SENSITIVITY | LEE, HWA S | 2877 | §101 | Final Rejection | 47d | AI Ready | Jul 20, 2022 |
| 17792464 | PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS | ANGEBRANNDT, MARTIN J | 1737 | Other | Final Rejection | 33d | Pending | Jul 13, 2022 |
| 17780287 | METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED ONTO A SUBSTRATE | ALAWDI, ANWER AHMED | 2851 | §103 | Final Rejection | 3d overdue | Pending | May 26, 2022 |
| 17777348 | METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHIC APPARATUS | WHITE, JAY MICHAEL | 2188 | §103 | Final Rejection | 4d overdue | Pending | May 17, 2022 |
| 17728691 | EBeam Inspection Method | SCHWARTZ, RAPHAEL M | 2671 | §112 | Non-Final OA | 66d overdue | Pending | Apr 25, 2022 |
| 17763698 | PROCESS MONITORING AND TUNING USING PREDICTION MODELS | PAN, YUHUI R | 2116 | §103 | Final Rejection | 15d overdue | Pending | Mar 25, 2022 |
| 17638472 | SEMICONDUCTOR DEVICE GEOMETRY METHOD AND SYSTEM | COLE, BRANDON S | 2128 | §103 | Final Rejection | 30d overdue | Pending | Feb 25, 2022 |
| 17634309 | MODELING METHOD FOR COMPUTATIONAL FINGERPRINTS | WHITE, JAY MICHAEL | 2188 | §103 | Final Rejection | 79d overdue | Pending | Feb 10, 2022 |
| 17632632 | METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING | WHITE, JAY MICHAEL | 2188 | §102 | Final Rejection | 86d overdue | Pending | Feb 03, 2022 |
| 17623829 | SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS | TAN, ALVIN H | 2118 | §103 | Final Rejection | 99d overdue | Pending | Dec 29, 2021 |
| 17607701 | A PATTERNING DEVICE | ANGEBRANNDT, MARTIN J | 1737 | §103 | Final Rejection | 103d overdue | Pending | Oct 29, 2021 |
| 17471363 | MACHINE-LEARNING BASED DEFECT IDENTIFICATION | DULANEY, BENJAMIN O | 2683 | §103 | Non-Final OA | 70d | Pending | Sep 10, 2021 |
| 17388926 | TEMPERATURE SENSING PROBE, BURL PLATE, LITHOGRAPHIC APPARATUS AND METHOD | WHITTINGTON, KENNETH | 3992 | Other | Non-Final OA | 27d | Pending | Jul 29, 2021 |
| 17311422 | APPARATUS AND METHOD FOR GROUPING IMAGE PATTERNS TO DETERMINE WAFER BEHAVIOR IN A PATTERNING PROCESS | LEE, HWA S | 2877 | §103 | Non-Final OA | 55d | Pending | Jun 07, 2021 |
| 17334574 | METHOD FOR DECREASING UNCERTAINTY IN MACHINE LEARNING MODEL PREDICTIONS | OCHOA, JUAN CARLOS | 2186 | §103 | Non-Final OA | 27d | AI Ready | May 28, 2021 |
| 17277583 | METROLOGY METHOD AND APPARATUS THEREFOR | WHITESELL, STEVEN H | 1759 | §103 | Final Rejection | 118d overdue | Pending | Mar 18, 2021 |
| 16971012 | METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL | KACKAR, RAM N | 1716 | §103 | Non-Final OA | 4d overdue | Pending | Aug 19, 2020 |
| 16340771 | METHODS & APPARATUS FOR CONTROLLING AN INDUSTRIAL PROCESS | LINDSAY, BERNARD G | 2119 | §103 | Non-Final OA | 28d overdue | Pending | Apr 10, 2019 |
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